Low-energy maskless lithography to mitigate radiation effects in advanced nanoscale microelectronics

Ended Definitive Contract Awarded Last action

Contract number
HDTRA114C0111
Awardee
Awarding agency
Obligated
$948,186

Award facts

Contract value 100% obligated
$949,985.43 Current and potential, with all options
Completion date 100% complete
Current and potential, with all options
Contracting staff
Set-aside
No set-aside
Competition
Full and Open Competition · 1 offer Basic Research
Pricing
Cost Plus Fixed Fee
Place of performance
Santa Clara, CA 95054, USA

Award details come from SAM.gov/FPDS.

Transactions

Action Obligated Date
Funding Only Action P00005 · Deobligate canceling funds. -$1,800
Other Administrative Action P00004 $0
Funding Only Action P00003 · Low-energy maskless lithography to mitigate radiation effects $1,000
Other Administrative Action P00002 $0
Other Administrative Action P00001 $0
Original award $948,985

About this award

The Defense Threat Reduction Agency awarded a definitive contract to Multibeam Corporation for low-energy maskless lithography to mitigate radiation effects in advanced nanoscale microelectronics on January 30, 2014, with a ceiling value of $949,985.43 under cost-plus-fixed-fee pricing.

Place of performance is Santa Clara, CA. The contract ultimate completion date is February 2, 2016. No set-aside was used.

Quick answers

Who was awarded contract HDTRA114C0111?

HDTRA114C0111 was awarded to Multibeam Corporation by Defense Threat Reduction Agency (Department of Defense) on January 30, 2014.

How much is contract HDTRA114C0111 worth?

The government has obligated $948,186 on HDTRA114C0111. Its current value, with exercised options, is $949,985.

Was contract HDTRA114C0111 competed?

The extent of competition for HDTRA114C0111 was full and open competition. The government received 1 offer.

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