Addendum and Acknowledgement 2.doc
DOC document 2 MB Posted
- Solicitation number
- 5-B176-Q-00304-00
- Issued by
-
Department of Energy Office of Science
About this file
This is Addendum #2 to Request for Quotation (RFQ) 5-B176-Q-00304-00 issued by Argonne National Laboratory's Procurement Department on February 25, 2025, for a Plasma Enhanced Chemical Vapor Deposition (PECVD) System.
The addendum provides answers to four technical questions regarding system specifications: the required chamber base pressure must be < 2x10^-6 Torr; a pressurized reactor design with an exterior chamber at lower pressure than the process chamber is required; the hot wall PECVD reactor chamber wall temperature must be 300 degrees C; and confirmation that this is not a replacement for an existing system at CNM. The original RFQ seeks domestic manufactured items meeting Buy American Act requirements, with proposals due by February 28, 2025 at 5:00pm CST. Evaluation will be conducted using Lowest Price Technically Acceptable criteria.
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Other files
| File | Type | Posted |
|---|---|---|
| Addendum and Acknowledgement Doc.doc | DOC document | |
| ANL-70A Reps and Certs Short-04-FEB-2025.PDF | ||
| ANL-70 Request for Quotation.doc | DOC document | |
| Appendix D8C-12-DEC-2023.PDF | ||
| Appendix A-71COM-13-FEB-2023.PDF | ||
| PECVD SOW 2.13.25.pdf |
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Text version
MOLLY MURTAUGH
Procurement Specialist 3 Office of the Chief Financial Officer
Procurement Department
Argonne National Laboratory
9700 South Cass Avenue, Bldg. 201
Lemont, IL 60439
(630)252-3094 mmurtaugh@anl.gov
02/25/2025
TO ALL OFFERORS:
Subject:
Request for 5-B176-Q-00304-00 No.
Addendum No. 002 Attached herewith for your information and use in preparing your proposal for subject project is one (1) copy of Addendum No.002.
Kindly acknowledge receipt of this Addendum by signing and returning one (1) copy of this letter and including this signed document with the completed Request for Quotation by the offer deadline.
Sincerely, MOLLY MURTAUGH
Procurement Specialist 3 Procurement Department
Receipt Acknowledged:
Company:
By:
cc:
File
CF
Addendum No.
TO
REQUEST FOR 5-B176-Q-00304-00
FOR
Argonne National Laboratory
BLDG. 201 OCF
9700 S. Cass Ave.
Lemont, IL 60439
02/25/2025 This addendum is being issued to incorporate the addition of questions and responses as follows:
1. What is the required chamber base pressure prior to deposition?
< 2x10^-6 Torr.
2. If the reaction chamber can reach a base pressure of 10 E-06 Torr pressure and the loadlock chamber can also reach a base pressure of 10E-06 Torr and the net direction of gas flow is from the reaction chamber to the loadlock chamber, will the pressurized reactor design with an exterior chamber at a much lower pressure than the process chamber still be required to prevent contamination from entering the deposition zone?
YES, "the pressurized reactor design with an exterior chamber at a much lower pressure than the process chamber" is required.
3. What is the required chamber wall temperature of the hot wall PECVD reactor?
300 degree C.
4. Is the system to replace an existing system with the same specifications at CNM?
No.
U. S. Department of Energy laboratory managed by UChicago Argonne, LLC
File details come from the government source that posted it. Updated .