ML Substrate 2 spec data sheet.pdf
PDF 115 KB Posted
- Attached to
- Blank single crystal Si substrates
- Solicitation number
- 4-B168-Q-00557-00
- Issued by
-
Department of Energy Office of Science
About this file
This document is a Mirror Specification Data Sheet that provides detailed technical specifications for blank single crystal Si substrates, which are a required component for building a new Horizontally deflecting Double Multilayer Monochromator (HDMM) at the 16ID-C hutch.
The key specifications include the substrate dimensions, surface geometry, microroughness, and other optical parameters. The substrates must meet strict tolerances for factors such as tangential slope error, mid-spatial frequency roughness, and high-spatial frequency roughness, with target values of 0.1 nm RMS. The substrates will be manufactured according to a specific drawing. Roughness measurements will be taken at 4 random positions. No coating will be applied.
This data sheet is being provided as part of a federal contract opportunity with Solicitation Number 4-B168-Q-00557-00, issued by the Department of Energy Office of Science. Proposals are due by 11:00am CST on June 22, 2024. The contract will be awarded to the lowest priced, technically acceptable offeror. Offerors must submit a completed ANL-70 Request for Quotation and ANL70A Pre-Award Information, Representations and Certifications.
View the file
Other files
| File | Type | Posted |
|---|---|---|
| Request for Quotation .doc | DOC document | |
| Drawing for substrate 2.pdf | ||
| ANL-71 COM ARGONNE TERMS AND CONDITIONS.PDF | ||
| ANL-70A Reps and Certs .pdf | ||
| Drawing for substrate 1.pdf | ||
| ML Substrate 1 spec data sheet.pdf |
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Text version
Mirror Specification Data Sheet type of footprint tangential radius tangential slope error // figure error spatial sampling 2 - 160 mm sagittal slope error spatial sampling 2 - 22 mm
MSFR (mid spatial frequency roughness) guaranteed: ≤ 0.15 nm (rms) target: ≤ 0.1 nm (rms) spatial sampling (ZYGO 50x) 1 µm - 170 µm HSFR (high spatial frequency roughness) guaranteed: ≤ 0.15 nm (rms) target: ≤ 0.1 nm (rms) spatial sampling rate / µm (AFM 1µm) < 0.75 µm
Si <100>
≤ 100 nrad (rms)
> 10 km > 5 km material surface quality geometry parameters
ML Substrate #2 comment microroughness optical surface
170 x 33 x 50 ± 0.1dimensions (L x W x H) / mm³ clear aperture (L x W) / mm² surface geometry flat substrate
160 x 22 sagittal radius
≤ 1 µrad (rms)
Substrate will be manufactured according to drawing 24-01-1112990.
Roughness measurements will be taken at 4 random positions (measured as "absolute RMS" with quartic error subtracted).
All edges lightly chamfered.
No coating will be applied.
page 1/2
Mirror Specification Data Sheet
Type of measurement Device
Tactile coordinate measurement precision coordinate measuring device UPMC 850 S-ACC Carat
Interferometry D100 direct measuring Interferometer
Micro-interferometry ZYGO, NewView 9000 (magnification 50x)
Atomic force microscopy Digital Instruments, DI nanoscope D3100M surface quality
< 0.1 nm 8 nm < λ < 1 µm
0.34 µm < λ < 170 µm p
< 300 nm
HSFR
Optical parameters Resolution spatial sampling area physical dimensions
MSFR
< 1 nm 1 mm < λ < 1000 mm
< 0.1 nm page 2/2
Tabelle1
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