ML Substrate 1 spec data sheet.pdf
PDF 138 KB Posted
- Attached to
- Blank single crystal Si substrates
- Solicitation number
- 4-B168-Q-00557-00
- Issued by
-
Department of Energy Office of Science
About this file
This document is a Mirror Specification Data Sheet from Laser Optics GmbH which provides detailed technical specifications for a single-crystal silicon (Si) substrate. The substrate is 170 x 33 x 30 mm in size, with a 160 x 22 mm clear aperture. Key specifications include a guaranteed mid-spatial frequency roughness (MSFR) of 0.15 nm RMS, a target MSFR of 0.1 nm RMS, and a high-spatial frequency roughness (HSFR) of 0.15 nm RMS with a target of 0.1 nm RMS. The substrate will be manufactured according to drawing 24-01-1112989 and measurements will be taken at 4 random positions. No coating will be applied.
The related federal contract opportunity is a Request for Proposal (RFP) from the Department of Energy Office of Science to supply blank single-crystal Si substrates as a component for the new Horizontally deflecting Double Multilayer Monochromator (HDMM) at the 16ID-C hutch. The RFP will be evaluated on the lowest price, technically acceptable methodology. Proposals are due by 11:00 am CST on June 22, 2024 and must include a fully executed ANL-70 Request for Quotation and ANL-70A Pre-Award Information, Representations and Certifications forms.
View the file
Other files
| File | Type | Posted |
|---|---|---|
| ANL-71 COM ARGONNE TERMS AND CONDITIONS.PDF | ||
| ANL-70A Reps and Certs .pdf | ||
| ML Substrate 2 spec data sheet.pdf | ||
| Drawing for substrate 1.pdf | ||
| Drawing for substrate 2.pdf | ||
| Request for Quotation .doc | DOC document |
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Text version
Mirror Specification Data Sheet
Laser Optics GmbH type of footprint tangential radius tangential slope error // figure error spatial sampling 2 - 160 mm sagittal slope error spatial sampling 2 - 22 mm
MSFR (mid spatial frequency roughness) guaranteed: ≤ 0.15 nm (rms) target: ≤ 0.1 nm (rms) spatial sampling (ZYGO 50x) 1 µm - 170 µm HSFR (high spatial frequency roughness) guaranteed: ≤ 0.15 nm (rms) target: ≤ 0.1 nm (rms) spatial sampling rate / µm (AFM 1µm) < 0.75 µm
Si <100>
≤ 100 nrad (rms)
> 10 km > 5 km material surface quality geometry parameters
ML Substrate #1 comment microroughness optical surface
170 x 33 x 30 ± 0.1dimensions (L x W x H) / mm³ clear aperture (L x W) / mm² surface geometry flat substrate
160 x 22 sagittal radius
≤ 1 µrad (rms)
Substrate will be manufactured according to drawing 24-01-1112989.
Roughness measurements will be taken at 4 random positions (measured as "absolute RMS" with quartic error subtracted).
All edges lightly chamfered.
No coating will be applied.
page 1/2
Mirror Specification Data Sheet
Type of measurement Device
Tactile coordinate measurement
Precision coordinate measuring device UPMC 850 S-ACC Carat
Interferometry D100 direct measuring Interferometer
Micro-interferometry ZYGO, NewView 9000 (magnification 50x)
Atomic force microscopy Digital Instruments, DI nanoscope D3100M surface quality
< 0.1 nm 8 nm < λ < 1 µm
0.34 µm < λ < 170 µm p
< 300 nm
HSFR
Optical parameters Resolution spatial sampling area physical dimensions
MSFR
< 1 nm 1 mm < λ < 1000 mm
< 0.1 nm page 2/2
Tabelle1
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