Project Grant 2512131
- This Project Grant award, titled "ECLIPSE-CHIPS: Plasma-Produced Materials to Investigate Laser-Produced Plasmas for Microelectronics Manufacturing", is provided by the National Science Foundation (NSF) Engineering program (CFDA 47.041). The $532,000 grant, awarded on September 1, 2025, supports research to develop a new approach for generating extreme ultraviolet (EUV) radiation, which is critical for advancing photolithography techniques used in microelectronics manufacturing. The...
- The National Science Foundation (NSF) awarded a $600,000 Project Grant to the University of California, Los Angeles (UCLA) under the Mathematical and Physical Sciences Federal Grant Program (CFDA 47.049). The ECLIPSE-CHIPS: GOALI award supports a collaborative research effort between UCLA and Lam Research Corporation, with participation from Sandia National Laboratories, to study the behavior of plasmas used in semiconductor chip manufacturing. The project aims to use laser-based techniques to...
- The National Science Foundation Division of Industrial Innovation awarded $250,000 under the Engineering (47.041) federal grant program to Colorado State University to enhance the mass production of advanced integrated circuits. The project aims to develop new technology to improve the efficiency of extreme ultraviolet lithography machines used in the semiconductor manufacturing process. Extreme ultraviolet lithography entered high-volume manufacturing in 2019 and relies on laser heating of...
- This $350,000 Project Grant awarded by the National Science Foundation's (CFDA 47.041) Engineering program will fund research to develop a new, solvent-free process for creating metal-based photoresists used in semiconductor manufacturing. The project aims to advance extreme ultraviolet (EUV) lithography, a critical technology for producing smaller, more powerful computer chips. Awarded to The Johns Hopkins University, the research will explore environmentally-friendly methods to fabricate these...
- This Project Grant award from the National Science Foundation (NSF) under the Mathematical and Physical Sciences program (CFDA 47.049) provides $300,000 in funding to the University of Washington to advance the field of semiconductor manufacturing through the development of new photoresist materials for extreme ultraviolet (EUV) photolithography. The two-year project aims to uncover the mechanisms behind the crosslinking and chemical etching of ultrathin photoresist films grown using molecular...
- This Project Grant award for $1,587,440.00 from the National Science Foundation's (NSF) Mathematical and Physical Sciences program supports a collaborative research effort to develop new photoresist materials for high-volume extreme ultraviolet (EUV) lithography to enable advanced manufacturing of next-generation computer chips. The interdisciplinary project combines expertise in polymer chemistry, materials characterization, computational modeling, and artificial intelligence to understand...
- This $276,000 Project Grant awarded by the National Science Foundation (NSF) Engineering program (CFDA 47.041) supports collaborative research to understand defect passivation, charge injection, and degradation in ultra-bright halide perovskite LEDs and lasers at Princeton University. The project aims to advance scientific knowledge and technological capabilities in these critical areas of emerging optoelectronic materials and devices. The award is effective from October 1, 2025 through...
- This federal Project Grant award of $3,540,000.00 from the National Science Foundation (NSF) Integrative Activities program (CFDA 47.083) will establish a state-of-the-art facility at Johns Hopkins University to advance photoresist research in extreme ultraviolet (EUV) lithography. The new EUV flood exposure tool will enable systematic investigations and provide stable, reproducible exposures to drive innovation in electronics and train the next generation of students in fields such as...
- This $433,986 Project Grant award from the National Science Foundation (NSF) Engineering program (CFDA 47.041) aims to revolutionize X-ray science through the development of new nanoscale photonics technologies. The principal investigator at the University of California, Los Angeles (UCLA) will experimentally validate the production of X-rays via quantum interference of electrons, enabling highly directional and monochromatic X-rays with energies up to several kiloelectron volts. This research...
- This National Science Foundation (NSF) Project Grant award under the Engineering program (CFDA 47.041) supports the development of a multiscale simulation tool that uses machine learning to predict the deformation behavior of semiconductors under light exposure. The $316,455 award to North Carolina State University will establish an electronic-to-mesoscale modeling framework to advance the understanding of "photoplasticity" - the phenomenon where light can cause materials to harden...
The National Science Foundation (NSF) awarded a $50,000 Project Grant under the Engineering program (CFDA 47.041) to The Trustees of Princeton University. The grant, titled "ECLIPSE-CHIPS: HIGH-FLUENCE COHERENT EUV LIGHT FROM ULTRAINTENSE LASER-PLASMA INTERACTIONS FOR ADVANCED NANOLITHOGRAPHY AND METROLOGY," will be used to explore advanced methods of generating extreme ultraviolet (EUV) light. This research aims to develop brighter and more coherent EUV beams, which can enable the creation of smaller and more efficient computer chips, benefiting semiconductor manufacturing and high-resolution imaging. The project will conduct detailed studies on EUV generation efficiency, beam quality, and polarization control, with the goal of revolutionizing semiconductor technology and advancing digital capabilities for various applications, including medicine, materials science, energy, and environmental monitoring. The award period is from September 1, 2025, to August 31, 2028.
Mod # | Description | ReasonForModification | Federal Obligation | Date |
|---|---|---|---|---|
| Not listed | $50.0k | 8/14/25 |