The National Science Foundation Division of Industrial Innovation awarded $250,000 under the Engineering (47.041) federal grant program to Colorado State University to enhance the mass production of advanced integrated circuits. The project aims to develop new technology to improve the efficiency of extreme ultraviolet lithography machines used in the semiconductor manufacturing process. Extreme ultraviolet lithography entered high-volume manufacturing in 2019 and relies on laser heating of liquid tin microdroplets to produce the required light, but higher power output is needed for cost-effective production. Colorado State University will demonstrate imaging techniques using an extreme ultraviolet laser probe to benchmark models of tin target plasma evolution and gain insights to increase the conversion efficiency and average power of lithography light sources. The award period is from March 15, 2022 through February 29, 2024.