Metal Etch Inductively Coupled Plasma Reactive Ion Etching (ICP - RIE) Tool
Awarded Limited / Sole Source Justification Posted
- Solicitation number
- N00173-20-Q-TS02
- Agency
- Office of Naval Research Secretary of the Navy, Department of Defense
- Set-aside
- No set-aside
Opportunity facts
- Contract number
- N0017320P2031 Federal contract award
- NAICS code
- 333242 Semiconductor Machinery Manufacturing
- Place of performance
- Washington DC 20375 USA
Notice details come from SAM.gov. Updated .
About this opportunity
This Limited/Sole Source Justification Notice from the Department of the Navy Secretary of the Navy Office of Naval Research authorizes the sole source procurement of one inductively coupled plasma reactive ion etching tool from Oxford Instruments America, Inc. by the Naval Research Laboratory. The tool must be capable of dry etching a wide variety of materials for installation in a Class 100 clean room, require a liquid nitrogen cooled resistively heated electrode that can automatically alternate between low and high temperatures as required by the user's process, providing a temperature range between -150C and +400C, and only Oxford Instruments has demonstrated an ability to meet these unique technical requirements. The contract was awarded to an unknown vendor for an unknown amount on September 30, 2020.
Notice text
Awarded contract N0017320P2031 to unknown vendor for unknown amount on 2020-09-30.
Attachments
| File | Type | Posted |
|---|---|---|
| 1-07_JA_11-0017-20_R5.pdf |
Notice history
| Notice | Type | Posted |
|---|---|---|
| Metal Etch Inductively Coupled Plasma Reactive Ion Etching (ICP - RIE) Tool | Limited / Sole Source Justification | |
| Metal Etch Inductively Coupled Plasma Reactive Ion Etching (ICP - RIE) Tool | Special Notice | |
| Metal Etch Inductively Coupled Plasma Reactive Ion Etching (ICP - RIE) Tool | Pre-Solicitation |
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