Metal Etch Inductively Coupled Plasma Reactive Ion Etching (ICP - RIE) Tool
Closed Special Notice Posted
A later notice was posted. The latest for this opportunity is the Limited / Sole Source Justification from . See the latest notice
- Solicitation number
- N00173-20-Q-TS02
- Agency
- Office of Naval Research Secretary of the Navy, Department of Defense
- Responses due
- Set-aside
- No set-aside
Opportunity facts
- NAICS code
- 333242 Semiconductor Machinery Manufacturing
- Place of performance
- Washington DC 20375 USA
Notice details come from SAM.gov. Updated .
About this opportunity
This Special Notice announces the U.S. Department of Navy's intent to enter into a sole source contract with Oxford Instruments America, Inc. for the procurement of an inductively coupled plasma reactive ion etching tool. The tool will be used by the Naval Research Laboratory for etching a variety of materials within a Class 100 clean room.
The tool must be capable of dry etching using chlorine and fluorine chemistries on materials including metals, metal oxides, nitrides, carbides, silicides, tellurides, and selenides. It must be computer controlled via menu-driven software and user friendly. The contemplated contract type is firm fixed price. Interested parties need not submit a proposal as this notice does not represent a request for competitive offers. The deadline for the sole source award is September 25, 2020. The purpose of the tool is to support etching activities for multiple users within NRL's clean room facility.
Notice text
The U.S. Department of Navy, Naval Research Laboratory (NRL) Contracting Division, proposes to enter into a sole source contract with Oxford Instruments America, Inc., for the procurement of an inductively coupled plasma reactive ion etcher (ICP-RIE) Tool using Chlorine and Fluorine chemistries in accordance with FAR 13.501(a) and 41 USC 1901, as no other system was capable of meeting the specifications required by NRL.
The Tool must be capable of dry etching a wide variety of materials including but not limited to Metal Oxides, mixed Metal Oxides, Nitrides, Carbides, Silicides, Tellurides, Selenides, Nickel, Chrome, and Aluminum. The Tool is to be installed within a Class 100 clean room. It is intended for use by multiple users within that site, must be computer controlled via menu-driven software, and user friendly.
The contemplated contract type will be a Firm Fixed Price (FFP). This notice is not a request for the receipt of proposals or competitive offers.
A determination by the Government to compete or not, is solely within the discretion of the Government.
The PSC is 3670 and the NAICS is 333242.
Notice history
| Notice | Type | Posted |
|---|---|---|
| Metal Etch Inductively Coupled Plasma Reactive Ion Etching (ICP - RIE) Tool | Limited / Sole Source Justification | |
| Metal Etch Inductively Coupled Plasma Reactive Ion Etching (ICP - RIE) Tool | Special Notice | |
| Metal Etch Inductively Coupled Plasma Reactive Ion Etching (ICP - RIE) Tool | Pre-Solicitation |
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