1-07_JA_11-0017-20_R5.pdf
PDF 2 MB Posted
- Attached to
- Metal Etch Inductively Coupled Plasma Reactive Ion Etching (ICP - RIE) Tool Federal contract opportunity
- Solicitation number
- N00173-20-Q-TS02
About this file
This justification and approval document authorizes a sole source procurement of an inductively coupled plasma reactive ion etching tool from Oxford Instruments America, Inc. by the Naval Research Laboratory. The tool must be capable of dry etching a wide variety of materials for installation in a Class 100 clean room and meet additional specifications. It requires a liquid nitrogen cooled resistively heated electrode that can automatically alternate between low and high temperatures as required by the user's process, providing a temperature range between -150C and +400C. The statutory authority for the sole source award is 41 U.S.C. 1901(e)(2) as implemented by FAR 13.501(a). Only Oxford Instruments has demonstrated an ability to meet the unique technical requirements for this tool.
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DEPARTMENT OF THE NAVY
NAVAL RESEARCH LABORATORY
4555 OVERLOOK AVE SW
WASHINGTON, DC 20375-5320
Purchase Request No.: 11-0017-20 J&A No.: J&A13.501-20-ST01
Justification for Other than Full and Open Competition Under Simplified Procedures For Certain
Commercial Items In Accordance With Federal Acquisition Regulation (FAR) 13.5
On the basis of the following, I, as the Contracting Officer, hereby approve the use of a sole source proposed contractual action pursuant to the authority of: ☒ 41 U.S.C. 1901 ☐ 41 U.S.C. 1903
1. The U.S. Department of Navy; Naval Research Laboratory Contracting Division proposes to enter into a sole source contract with Oxford Instruments America, Inc., under simplified procedures for certain commercial items included in FAR subpart 13.5.
2. The nature and/or description of the action being approved, i.e., sole source under procedures for certain commercial items in accordance with FAR 13.5.
This Justification and Approval (J&A) authorizes and approves the procurement of the Inductively Coupled Plasma (ICP) Reactive Ion Etching (RIE) Tool under FAR 13.5 sole source procedures for certain commercial items.
3. A description of the supplies and/or services required, including the delivery schedule and/or the period of performance (inclusive of all option periods), and the estimated dollar value of the acquisition.
The ICP-RIE Tool is required to be capable of dry etching a wide variety of materials, for installation in a Class 100 clean room. The tool must meet additional requirements indicated in the specifications document. This is a commercial item
4. The statutory authority permitting sole source.
The authority for permitting other than full and open competition is 41 U.S.C. 1901(e)(2), implemented by FAR 13.501(a).
☒ 41 U.S.C. 1901 ☐ 41 U.S.C. 1903
5. A statement demonstrating the unique qualifications of the proposed contractor or the nature of the action requiring use of the authority.
Only Oxford Instruments has demonstrated an ability to meet the unique specifications for the requirements of this tool, including the following:
The liquid nitrogen cooled resistively heated electrode automatically must alternate between low and high temps as demanded by the user’s process. This provides a temperature range between -150°C and +400°C allowing for the widest available process temperature options for process development.
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