NIST-SS23-CHIPS-0025.docx
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- NIST-SS23-CHIPS-0025
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This document is a sources sought notice from the National Institute of Standards and Technology seeking information to procure a suite of three scanning electron and focused ion beam microscopes. The notice requests capability statements from sources able to provide a commercial item solution meeting minimum specifications for two focused ion beam/scanning electron microscope systems and one scanning electron microscope system. Common requirements for the systems include identical sample stage and goniometer geometry to allow transfer of sample holders and accessories between instruments, as well as identical or extremely similar computer software and user interfaces and a common scripting language of Python to enable use of scripted routines on any of the instruments. Individual specifications are provided for the focused ion beam systems specializing in transmission electron microscopy and atom probe tomography sample preparation.
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| File | Type | Posted |
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| 0025-Focused Ion Beam Lab Layout (81-1C109).pdf |
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NIST-SS23-CHIPS-0025
6640 / 334516
Primary POC: Forest Crumpler (forest.crumpler@nist.gov) Secondary POC: Tracy Retterer (tracy.retterer@nist.gov)
Title: Suite of Scanning Electron and Focused Ion Beam Microscopes
BACKGROUND
The FIB-SEM systems and SEM system will be installed and operated in a multi-user precision imaging facility. The imaging facility supports multiple internal users by providing microscopy and microanalysis capabilities. Samples of interest include (but are not limited to) microfabricated, on-wafer devices and other solid-state electronics systems, as well as metal alloys.
The FIB-SEM systems and SEM system will be installed on the Boulder, CO campus. The contractor shall furnish the necessary personnel, material, equipment, and services to fabricate, install, and test two complete focused ion beam/scanning electron microscope systems and one complete scanning electron microscope system. The contractor shall provide training at the time of installation and the complete systems must be fully integrated, serviced, and warrantied by the single offeror.
NIST requires that the two FIB-SEM systems and one SEM system are from the same manufacturer to enable correlative imaging studies which require identical data collection and analysis software, as well as an identical scripting/programming language/interface between the three instruments. NIST additionally requires that all accessories (e.g. standard and/or specialized sample holders, specialized detectors) can be used on any of the three instruments; stages and/or goniometers on the three systems shall accept identical sample holders. Lastly, NIST requires three systems with identical (or significantly similar) software user interfaces to minimize the time required to train users between the two microscopes.
NIST is seeking information from sources that may be capable of providing a commercial item solution that meets or exceeds the following draft minimum specifications:
Common Requirements Between Systems:
| 1) | The systems below shall all have identical sample stage and/or goniometer geometry to | allow for the transfer of sample holders and accessories between systems |
| 2) | The systems listed below shall have identical (or extremely similar) computer | software/user interfaces |
| 3) | The systems below shall share a common scripting language (preferably Python based) | such that scripted routines or automations can be used on either of the instruments |
Focused Ion Beam System 1:
A focused ion beam/scanning electron microscope (FIB/SEM) system to specialize in the production of samples for transmission electron microscopy and atom probe tomography.
Specifications:
| 1) | Vacuum system capable of maintaining high vacuum (<1×10-5 Torr) in the sample | chamber | ||
| 2) | A scanning electron imaging system that includes: | |||
| a. | The ability to produce an electron beam at accelerating voltages between 0.5 kV and 30 | kV (Please provide information on the capability to produce electron beam landing | energies less than 0.5 keV). | |
| b. | An imaging resolution of 0.8 nm or better (Please provide information on the capability to | provide an electron beam energy better than 0.8 nm). | ||
| 3) | A scanning Ga+ ion beam system that includes: | |||
| a. | The ability to produce an ion beam at accelerating voltages between 0.5 kV and 30 kV | |||
| b. | The ion beam shall be optimized for low acceleration voltages to minimize Ga+ ion | implementation on the sample surface (Please provide information on the low | accelerating voltage of your ion beam system). | |
| c. | A maximum ion beam current of at least 65 nA (Please provide information on the | abilities of your ion system to exceed beam currents of 65 nA). | ||
| d. | A resolution of 3.0 nm or better | |||
| 4) | A suite of electron and/or ion detectors to include: | |||
| a. | A secondary electron detector | |||
| b. | An in-lens secondary electron and backscatter detector | |||
| c. | A retractable segmented backscatter electron detector (Please provide information on | the segment geometry of the detector). | ||
| d. | A detector for imaging with transmitted electrons (STEM) | |||
| e. | Additional electron/ion detectors (Please provide information on additional detectors not | listed above). | ||
| 5) | A camera to allow viewing inside the chamber (Please provide information on your | capability to provide more than one camera to view inside of the chamber). | ||
| 6) | Gas injection system to allow for the electron- or ion-beam deposition of platinum, | carbon, tungsten, and an insulating material, among other chemistries (Please provide | information on the geometry of your gas injection system(s)). | |
| 7) | A software-integrated micromanipulator (Please provide information about the software | integration of your micromanipulator). | ||
| 8) | A Python-based scripting interface to allow for automated operation of the system | (Please provide information about the instrument scripting interface if it is not Python- | based). | |
| 9) | The ability to be fitted with X-ray and diffraction detectors from other vendors including | (in alphabetical order): Bruker Quantax, EDAX Velocity, EDAX Octane, Oxford Ultim | Max, Oxford Symmetry S3, or similar (Please provide information on whether or not your | system and/or software integration excludes any major analytical detector vendor). |
| 10) | A five-axis stage with X/Y travel of 150 mm or greater (Please provide information on | the stage mobility (including X/Y motion and tilt) when a six inch (152.4 mm) silicon | wafer is loaded into the system). |
Focused Ion Beam System 2:
A focused ion beam/scanning electron microscope (FIB/SEM) system to specialize in the chemical and structural analysis of materials. This system will also serve as a secondary sample preparation system for transmission electron microscopy and atom probe tomography.
Specifications:
| 1) | Vacuum system capable of maintaining high vacuum (<1×10-5 ¬¬Torr) in the sample | chamber | |
| 2) | A scanning electron imaging system that includes: | ||
| a. | The ability to produce a electron beam at accelerating voltages between 1 kV and 30 kV | ||
| b. | An imaging resolution of 1.0 nm or better | ||
| 3) | A scanning Ga+ ion beam system that includes: | ||
| a. | The ability to produce an ion beam at accelerating voltages between 0.5 kV and 30 kV | ||
| b. | A maximum ion beam current of at least 65 nA | ||
| c. | A resolution of 4.0 nm or better | ||
| 4) | A suite of electron and/or ion detectors to include: | ||
| a. | A secondary electron detector | ||
| b. | An in-lens secondary electron and backscatter detector | ||
| (Please provide information about additionally available detectors (in-column or | otherwise) | ||
| c. | A retractable segmented backscatter electron detector | ||
| d. | A detector for imaging with transmitted electrons (STEM) | ||
| 5) | A camera to allow viewing inside the chamber | ||
| (Please provide information on your capability to provide more than one camera to view | inside of the chamber). | ||
| 6) | Gas injection system to allow for the electron- or ion-beam deposition of platinum and | carbon | |
| 7) | A software-integrated micromanipulator | ||
| (Please provide information about the software integration of your micromanipulator). | |||
| 8) | A Python-based scripting interface to allow for automated operation of the system | ||
| (If not Python-based, please provide information about the instrument scripting | interface). | ||
| 9) | The ability to be fitted with X-ray and diffraction detectors from other vendors (Bruker | Quantax, EDAX Velocity, EDAX Octane, Oxford Ultim Max, Oxford Symmetry S3, or | similar) |
| 10) | The ability to be fitted with a software-integrated secondary ion mass spectrometer | (SIMS) system for the chemical analysis of secondary ions | |
| (Please provide information about your common SIMS detector options and information | about whether you provide any SIMS detector options which are integrated into your | main user interface) | |
| 11) | A five-axis stage with X/Y travel of 100 mm or greater | ||
| (Please provide information about stage motion greater than 100 mm) |
Scanning Electron Microscope System:
A scanning electron microscope (SEM) system to specialize in the structural and chemical analysis of materials.
Specifications:
| 1) | Vacuum system capable of maintaining high vacuum (<1×10-5 ¬¬Torr) in the sample | chamber | |
| 2) | A scanning electron imaging system that includes: | ||
| a. The ability to produce an electron beam at accelerating voltages between 1 kV and 30 | kV | ||
| (Please provide information on your capability to provide beam voltages less than 1 kV). | |||
| b. | An imaging resolution of 1.0 nm or better | ||
| (Please provide information on your capability to provide electron imaging resolutions | better than 1.0 nm). | ||
| 3) | A suite of electron detectors to include: | ||
| a. | A secondary electron detector | ||
| b. | An in-lens secondary electron and backscatter detector | ||
| (Please provide information about additionally available detectors (in-column or | otherwise) | ||
| c. | A retractable segmented backscatter electron detector | ||
| d. | A detector for imaging with transmitted electrons (STEM) | ||
| 4) | A camera to allow viewing inside the chamber | ||
| (Please provide information on your capability to provide more than one camera to view | inside of the chamber) | ||
| 5) | A Python-based scripting interface to allow for automated operation of the system | ||
| (If not Python-based, provide information about the instrument scripting interface) | |||
| 6) | The ability to be fitted with X-ray and diffraction detectors from other vendors, including | (in alphabetical order): Bruker Quantax, EDAX Velocity, EDAX Octane, Oxford Ultim | Max, Oxford Symmetry S3, or similar |
| 7) | The ability to be fitted with a cathodoluminescence spectrometer from other vendors, | including (in alphabetical order): Gatan Monarc, Horiba CLUE, or similar | |
| 8) | A five-axis stage with X/Y travel of 100 mm or greater | ||
| (Please provide information about stage motion greater than 100 mm) |
Instrument Footprint/Space Requirements:
Please provide the full instrument footprint (including all electronics cabinets, pumps, chillers, and other support equipment) in your response to this Sources Sought Notice.
Focused Ion Beam System 1 and Focused Ion Beam System 2 must fit within a 23’×23’ laboratory space (81-1C109). All pumps and chillers must be placed in the attached service galley.
A portion of the lab is occupied by cabinets and countertops. These cabinets and countertops can be removed, if necessary, but the preference is to leave them (wholly or partially) in place. Passthroughs for vacuum hoses, water hoses, etc. can/will be cut in the wall between the laboratory space and the attached service galley. A dimensioned drawing of the laboratory space (81-1C109) is included with this Sources Sought Notice.
There is no current laboratory space requirement for the Scanning Electron Microscope system. The full instrument footprint for the Scanning Electron Microscope system (including all electronics cabinets, pumps, chillers, and other support equipment) shall be included in your response.
HOW TO RESPOND TO THIS NOTICE
In responding to this notice, please DO NOT PROVIDE PROPRIETARY INFORRMATION. Please include only the following information, readable in either Microsoft Word 365, Microsoft Excel 365, or .pdf format, in the response: Submit the response by email to the Primary Point of Contact and, if specified, to the Secondary Point of Contact specialist listed at the bottom of this notice as soon as possible, and preferably before the closing date and time of this notice.
· Provide the complete name of your company, address, name of contact for follow-up questions, their email, their phone number and, if your company has an active registration in https://sam.gov, your company’s Unique Entity ID (UEI).
· Identify laboratory equipment that your company sells that is of the nature addressed in the BACKGROUND section of this notice. Include brand name, make, model, and/or other distinguishing information.
· State if your company is the manufacturer of the identified equipment or is a retailer or wholesaler that normally sells the identified equipment. If the latter, indicate whether the manufacturer authorized in writing for your company to sell the identified equipment on behalf of the manufacturer.
· Describe performance capabilities and relevant or beneficial physical and functional features for any equipment you identified to satisfy the NIST-identified minimum specifications described in this notice.
· Identify any aspects of the NIST market research notice, including instructions, and draft minimum specifications in the BACKGROUND section above that could be viewed as unduly restrictive or contain unnecessary barriers that adversely affect your ability to fully participate and indicate why. In such a scenario, please offer suggestions for how the market research notice and draft minimum specifications could be made more inclusive and competitive.
· Discuss whether the equipment that your company sells and which you describe in your response to this notice may be customized to specifications and indicate any limits to customization.
· For the NAICS code listed in this notice:
· Indicate whether your company is (a) a small business or (b) other than small business. See the Table of Small Business Size Standards and the associated .pdf download file for small business size standards and additional information.
· If you believe the NAICS code listed in this notice is not the best NAICS code for the type of product addressed in this notice, identify an alternative NAICS code that you believe would be more appropriate for the planned procurement.
· Describe services that are available with the purchase of the aforementioned equipment from your company such as installation, training, and equipment maintenance.
· Describe standard terms and conditions of sale offered by your company for the aforementioned equipment such as: delivery time after your company accepts the order; FOB shipping terms: manufacturer warranty (including details regarding nature and duration); if available, description(s) of available extended warranty; equipment setup and test; operator and service instruction manual(s); cleanup after installation; and if applicable, other offered services. Provide a copy of manufacturer standard terms and conditions that typically relate to the sale of the specified equipment, if available.
· State whether your company offers facility renovation services related to installation of the aforementioned equipment at its delivery destination, if required per the NIST-identified minimum specifications, and provide description of services. Indicate if your company performs the facility renovation services or typically subcontracts the work to another company. Indicate if your company would be interested inspecting the intended installation site during the market research phase.
· State published price, discount or rebate arrangements for aforementioned equipment and/or provide link to access company’s published prices for equipment and services.
· State whether the aforementioned equipment is manufactured in the United States and, if not, state the name of the country where the equipment is manufactured.
· Identify any plans/possibilities for changes in manufacturing location of the aforementioned equipment and provide relevant details.
· If the aforementioned equipment and related services are available for purchase on any existing Federal Supply Schedule contract(s) or other contracts against which NIST may be able place orders, identify the contract number(s) and other relevant information.
· Identify any customers in the public or private sectors in which you provided the aforementioned or similar equipment. Include customer(s) information: company name, phone number, point of contact, email address.
· Provide any other information that you believe would be valuable for NIST to know as part of its market research for this requirement.
· State if you require NIST to provide additional information to improve your understanding of the government’s requirement and/or would like to meet with NIST representatives to discuss the requirement and the capabilities of the identified equipment.
IMPORTANT NOTES
The information received in response to this notice will be reviewed and considered so that NIST may appropriately solicit for its requirements in the near future.
This notice shall not be construed as a commitment by NIST to issue a solicitation or ultimately award a contract.
Responses will not be considered as proposals or quotations.
No award will be made as a result of this notice.
NIST is not responsible for any costs incurred by the respondents to this notice.
NIST reserves the right to use information provided by respondents for any purpose deemed necessary and appropriate.
Thank you for taking the time to submit a response to this request!
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