Project Grant 2522586
- The National Science Foundation's (NSF) Mathematical and Physical Sciences federal grant program awarded a $412,542 Project Grant to the University of Wisconsin - Madison to support a collaborative research project titled "AI-Informed, Closed-Loop Design of Negative Resists for High-Volume EUV Lithography." This 4-year project, running from October 1, 2025 to September 30, 2029, will integrate expertise in polymer chemistry, materials characterization, computational modeling, and...
- This Project Grant award from the National Science Foundation's (NSF) Mathematical and Physical Sciences program will support the development of a new solvent-free process for creating metal-based extreme ultraviolet (EUV) photoresists for semiconductor manufacturing. The $150,000 grant, awarded to The Johns Hopkins University, aims to create an environmentally-friendly fabrication method for these advanced photoresists that can enable the production of more powerful, efficient, and reliable...
- This $260,000 Project Grant awarded by the National Science Foundation (NSF) under the Mathematical and Physical Sciences (CFDA 47.049) program supports a collaborative effort by researchers at the University of Texas at Dallas, Johns Hopkins University, and the University of Texas at Austin to develop new materials for advanced computer chips. The key objectives are to: (1) design novel indium-based extreme ultraviolet (EUV) resists using computational and machine learning tools; (2) synthesize...
- The National Science Foundation (NSF) awarded a $3,540,000 Project Grant under its Integrative Activities program (CFDA 47.083) to The Johns Hopkins University in Baltimore, Maryland. The grant will support the acquisition and installation of an Extreme Ultraviolet (EUV) resist flood exposure tool at the university. This state-of-the-art facility will enable systematic investigations into advanced photoresist materials and manufacturing processes critical for the development of smaller,...
- This federal Project Grant award of $532,000 from the National Science Foundation's Engineering program (CFDA 47.041) supports research at the University of California, Riverside to explore a new approach for generating extreme ultraviolet (EUV) radiation for advanced photolithography, a critical technology enabling the manufacture of microelectronics. The project aims to utilize a plasma-produced tin aerosol that can be ionized by a laser to generate bright EUV radiation, with the goal of...
- This Project Grant awarded by the National Science Foundation (NSF) Division of Chemistry, under the Mathematical and Physical Sciences (CFDA 47.049) Federal Grant Program, will fund a collaborative research effort between the University of Florida and Johns Hopkins University to explore the underlying chemical reactions involved in two technologically important processes: focused electron beam-induced deposition (FEBID) and extreme ultraviolet lithography (EUVL). The $354,551 award will support...
- The National Science Foundation awarded the University of Illinois a $700,485 Project Grant under the Mathematical and Physical Sciences program (CFDA 47.049) to develop two-dimensional amorphous carbon materials with tunable atomic structures for use as a novel dielectric in electronic devices. Over a four-year period ending February 2026, the university will utilize a solution-based process to precisely control the thickness and degree of medium-range ordering in carbon monolayers and...
- This award from the National Science Foundation's (NSF) Technology, Innovation, and Partnerships (CFDA 47.084) program provides $1,168,940 in funding to Exigent Solutions, Inc. to develop a physics-guided AI platform that accelerates the design of extreme ultraviolet (EUV) masks used in semiconductor manufacturing. The project aims to strengthen domestic semiconductor fabrication capacity by shortening design-to-manufacturing cycles, reducing waste, and lowering production costs. The intelligent...
- The National Science Foundation (NSF) awarded a $540,000 Project Grant under the Mathematical and Physical Sciences program (CFDA 47.049) to Professors Smith and Schleife at the University of Illinois Urbana-Champaign. The grant supports their research on a new synthetic approach for manufacturing diverse classes of nanocrystals, which are critical components in next-generation electronics, displays, solar cells, and medical tests. The key objectives of the 3-year project (9/1/2025 -...
- Under a $425,448 Project Grant from the National Science Foundation (NSF) Division of Chemistry, the University of Florida is conducting collaborative research on electron-induced reactivity of organometallic precursors for focused electron beam-induced deposition (FEBID) and extreme ultraviolet (EUV) lithography resists. This 3-year research effort, in partnership with Johns Hopkins University, aims to develop a holistic understanding of electron interactions with organometallic complexes to...
This Project Grant award of $1,587,440 from the National Science Foundation's (NSF) Mathematical and Physical Sciences program (CFDA 47.049) will fund a collaborative research project to develop new photoresist materials for enabling high-volume extreme ultraviolet (EUV) lithography in semiconductor manufacturing. The project, conducted by the University of Illinois, will integrate expertise in polymer chemistry, materials characterization, computational modeling, and AI-informed materials design to understand the relationship between molecular structure and nanoscale patterning in these photoresists. The new photoresist materials and patterning methodologies developed through this project are expected to broadly benefit the U.S. by enabling advanced manufacturing of next-generation computer chips with applications spanning personal electronics, healthcare, supercomputing, and generative AI. This interdisciplinary research effort will also include K-12 outreach and student training to prepare the future STEM workforce.
Mod # | Description | ReasonForModification | Federal Obligation | Date |
|---|---|---|---|---|
| Not listed | $1.6m | 9/8/25 |