Attachment A - Specification - XGH-TS-20-0001-R00 - Neutron Mirrors and Substrates for Nested Mirror Optics - 10-27-2025.pdf

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Neutron Mirrors and Substrates for Nested Mirror Optics
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PR424551
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This specification document outlines procurement requirements for neutron mirrors and substrates for nested mirror optics (NMOs) at Oak Ridge National Laboratory (ORNL), managed by UT-Battelle, LLC for the US Department of Energy. The procurement includes 100 small and 100 large non-depolarizing supermirror Ni/Ti neutron mirrors, as well as 50 small and 50 large silicon wafer substrates, all with precise dimensional specifications (0.3mm thick, 34mm or 54mm width, 60mm length).

The specification requires the seller to fabricate these components for use at the Spallation Neutron Source (SNS) and High Flux Isotope Reactor (HFIR) facilities. Key requirements include neutron mirror testing, material certifications, detailed design drawings, and a shipping plan. The mirrors are designed to improve signal-to-background ratios for neutron scattering experiments, particularly for small sample quantities in constrained environments like pressure cells or high magnetic fields. The lead time from contract award to delivery is specified as not exceeding 3 months, with all documentation to be submitted electronically in English.

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XGH-TS-20-0001-R00

Specification for Procurement of

Neutron Mirrors and Substrates for Nested Mirror Optics

Author(s)

Ian Turnbull

Steve Kuhn

Date Published:

10/27/2025

Prepared by

OAK RIDGE NATIONAL LABORATORY

Oak Ridge, TN 37831-6283 managed by

UT-BATTELLE, LLC

for the

US DEPARTMENT OF ENERGY

under contract DE-AC05-00OR22725

This report was prepared as an account of work sponsored by an agency of the United States Government. Neither the United States Government nor any agency thereof, nor any of their employees, makes any warranty, express or implied, or assumes any legal liability or responsibility for the accuracy, completeness, or usefulness of any information, apparatus, product, or process disclosed, or represents that its use would not infringe privately owned rights. Reference herein to any specific commercial product, process, or service by trade name, trademark, manufacturer, or otherwise, does not necessarily constitute or imply its endorsement, recommendation, or favoring by the United States Government or any agency thereof. The views and opinions of authors expressed herein do not necessarily state or reflect those of the United States Government or any agency thereof.

iii

CONTENTS

Contents

CONTENTS ................................................................................................................................................. iii

1. Approvals

2. Introduction

3. Scope

4. Part Specifications

4.1 Small Non-depolarizing Supermirror Ni/Ti

4.2 Large Non-depolarizing Supermirror Ni/Ti

4.3 Small Si Wafer Substrate

4.4 Large Si Wafer Substrate

5. Testing

6. Lead Time

7. Documentation

7.1 Drawings

7.2 Material Certifications

7.3 Inspections and Test Results

7.4 Shipping Plan

Specification for Procurement of Neutron Mirrors and Substrates for Nested Mirror Optics

1. APPROVALS

Rev 00 Rev 01 Rev 02 Rev 03

Approvals

Responsible Engineer

Scientist

Approver

Approver

Revision Description of Changes

0 Initial Release i0t Signature sik Signature yth Signature

5lc Signature

2. INTRODUCTION

ORNL is developing nested mirror optics (NMOs) to act as corrective lenses for neutron scattering instruments at both pulsed and reactor neutron sources. Nested mirror optics deliver a full optics system in a device the size of a shoebox, which means they can be easily exchanged based on the current need of an instrument. This will greatly improve the signal-to-background ratios for neutron scattering, especially for experiments involving new materials or biological samples that can only be prepared in small quantities and where samples are in constrained environments such as pressure cells or high magnetic fields. The nested mirror optics consist of several individual, neutron mirror segments mounted in a frame that holds each mirror in a specific orientation. Silicon wafer substrates without a neutron mirror coating are used for evaluation of the frame.

3. SCOPE

Herein, the term “Seller” shall refer to the parties responsible for providing neutron mirrors and substrates within the scope defined in this specification, and “Company” shall refer to UT-Battelle, LLC, and its representatives. This specification establishes the requirements for Seller materials of construction, fabrication, inspection, testing, delivery, and final Company acceptance of the neutron mirrors and substrates. The neutron mirrors and substrates shall be manufactured for use at the Spallation Neutron Source (SNS) and the High Flux Isotope Reactor (HFIR) facilities at the Department of Energy’s Oak Ridge National Laboratory (ORNL) in Oak Ridge, Tennessee, USA. The Seller shall manufacture, inspect, test, package, and ship the neutron mirrors and substrates in accordance with all requirements in this specification.

Any exceptions to this specification shall be clearly noted as such in the Seller’s proposal documentation.

Where the Seller takes exceptions, the Seller shall propose alternatives

4. PART SPECIFICATIONS

The parts provided by the Seller are listed below. All parts shall be fabricated by one Seller to maintain consistency in part quality.

4.1 Small Non-depolarizing Supermirror Ni/Ti

• Quantity: 100

• Substrate:

o Material: Si wafer o Thickness: 0.3mm o Width: 34mm o Length: 60mm

• Coating:

o Ni/Ti, o m = 3.0, o Rave = 88%, o Only one side shall be coated o On the side that is coated, a 2mm long strip along each of the long edges shall remain uncoated.

4.2 Large Non-depolarizing Supermirror Ni/Ti

• Quantity: 100

• Substrate:

o Material: Si wafer o Thickness: 0.3mm o Width: 54mm o Length: 60mm

• Coating:

o Ni/Ti, o m = 3.0, o Rave = 88%, o Only one side shall be coated o On the side that is coated, a 2mm long strip along each of the long edges shall remain uncoated.

4.3 Small Si Wafer Substrate

• Quantity: 50

• Substrate:

o Material: Si wafer o Thickness: 0.3mm o Width: 34mm o Length: 60mm

• Coating: None

4.4 Large Si Wafer Substrate

• Quantity: 50

• Substrate:

o Material: Si wafer o Thickness: 0.3mm o Width: 54mm o Length: 60mm

• Coating: None

5. TESTING

The seller shall test the neutron mirrors (items 4.1 & 4.2) with neutrons to verify the quality and performance of the neutron mirror coating.

6. LEAD TIME

The lead time (from awarding of the contract to delivery) shall not exceed 3 months.

7. DOCUMENTATION

Wherever feasible, all documentation shall be submitted in an electronic format to the TPO via email unless otherwise instructed by the TPO. Adobe Portable Document Format (PDF) has been listed as an acceptable format for all documents, including drawings that would normally be printed on paper.

Alternative formats shall be approved by the TPO.

All documentation submitted to the Company shall be in English. Translated versions of original documents signed by the personnel responsible are acceptable.

7.1 Drawings

The Seller shall submit detail design drawings for the neutron mirrors and substrate to the Company prior to fabrication. The drawing submittal shall be sufficient to support re-fabrication (exact replacement).

7.2 Material Certifications

The Seller shall submit material certifications for the Si wafer substrates to the Company prior to shipping.

7.3 Inspections and Test Results

The Seller shall submit test results (from evaluations described in Section 5) to the Company prior to shipping.

All inspections, tests or examination reports shall contain the following information, as a minimum:

• Unique report number

• Job title

• Inspection date

• Equipment identification

• Specific inspection, or examination, including procedure designation

• Identification of measuring and test equipment used and their latest calibration dates

• Inspection results

• Actions taken because of any discrepancies noted during the inspection

• Signature or initials of the person performing the inspection or examination and their qualifications, and the signature or initials of the person witnessing the test.

7.4 Shipping Plan

The Seller shall create a shipping plan that describes how the neutron mirrors and substrates will be packaged and shipped. This plan shall be submitted to and approved by the Company prior to shipping.

CONTENTS
1. Approvals
2. Introduction
3. Scope
4. Part Specifications
4.1 Small Non-depolarizing Supermirror Ni/Ti
4.2 Large Non-depolarizing Supermirror Ni/Ti
4.3 Small Si Wafer Substrate
4.4 Large Si Wafer Substrate
5. Testing
6. Lead Time
7. Documentation
7.1 Drawings
7.2 Material Certifications
7.3 Inspections and Test Results
7.4 Shipping Plan

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