Julia jean LLC aims to carry forward NIST-patented technology for a cold source field emitter based on silicon carbide structures
Ended Cooperative Agreement Awarded Last action
- Award ID
- 70NANB22H185
- Recipient
-
Julia Jean, LLC UEI EMYZH3MUHNV5
- Awarding agency
-
National Institute of Standards and Technology
Department of Commerce
- Obligated
- $300,000
Award facts
- Assistance listing
- 11.620 Science, Technology, Business and/or Education Outreach
- Completion date
- Originally
- Place of performance
- Irvine, CA 92603, USA
Award details come from USAspending.gov.
About this award
Julia Jean LLC received a $300,000 cooperative agreement award from the Department of Commerce National Institute of Standards and Technology under the Science, Technology, Business and/or Education Outreach federal grant program (CFDA 11.620). The award aims to advance NIST-patented cold source field emitter technology based on silicon carbide structures for applications such as medical imaging and national security. Activities include comparing lithography process variables to identify optimal recipes for producing microscale structures in porous silicon carbide, and analyzing outcomes against low-throughput focused ion beam milling. The resulting intellectual property is intended to benefit fields using field emission arrays. Julia Jean also plans to provide $30,000 in technical and business assistance subawards to support intellectual property development. The award period is from October 1, 2022 through May 31, 2023.
Description
- Activities
- This proposal will compare the variables in lithography steps to identify the best process. Variables tested will include (a) whether mask-based lithography can substitute for low-throughput focused ION beam lithography, producing similarly shaped microscale structures; (b) whether the technical aspects of the required lithography steps are compatible with nists electrochemistry procedure; and (c) whether electrochemistry should be performed before or after lithography, before versus after introducing porosity, and then scale up the best process.
- Expected outcomes
- The outcomes for different process sequences will be analyzed with against low-throughput ION milling (FIB) to define microscale structures in porous silicon carbide. The resulting recipes will lead to new intellectual property.
- Intended beneficiaries
- Field emission arrays allow for advanced, diffraction-based identification of materials, as seen in medical imaging (e.g., x-RAY for medical CT scans), airport baggage screening, and related national security applications (e.g, x-RAY, radar, and microwave).
- Subrecipient activities
- Julia jean plans to award funds for technical and business assistance (taba) to assist with intellectual property assistance. The company providing taba has not yet been identified.
Transactions
| Action | Obligated | Date |
|---|---|---|
| Amendment | $0 | |
| Amendment | $0 | |
| Amendment | $100,000 | |
| Amendment | $100,000 | |
| Original award | $100,000 |
Quick answers
Who received award 70NANB22H185?
70NANB22H185 was awarded to Julia Jean, LLC by National Institute of Standards and Technology (Department of Commerce) on October 1, 2022.
How much is award 70NANB22H185 worth?
$300,000 has been obligated on 70NANB22H185.
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