CHIPS R&D: Vector Network Analyzer
Past New Requirement Updated
- Agency
-
National Institute of Standards and Technology
Department of Commerce
- Solicitation expected
- Estimated value
- $251,000 to $500,000
- Set-aside
- No set-aside
Forecast facts
- Anticipated award
- Through
- NAICS code
- 334413 Semiconductor and Related Device Manufacturing
- Place of performance
- Boulder, Colorado, United States
- Forecast number
- 60741
- Points of contact
-
- Nathali Clark nathali.clark@chips.gov
Forecast details come from the Commerce Department's procurement forecast. Agencies' dates and values are estimates.
About this forecast
The Department of Commerce's National Institute of Standards and Technology (NIST) is forecasting a procurement for a Vector Network Analyzer to support the CHIPS Metrology Project 5.04 for Grand Challenge 5, focusing on Modeling and Simulating Semiconductor Manufacturing Processes. The RF Waveform and Rapid Frequency Comb Diagnostics for Plasma Etching project team requires this instrument to develop a high-power RF waveform measurement system for monitoring plasma etching processes. The estimated solicitation release date is February 14, 2026, with an anticipated award date of May 14, 2026.
The estimated award value ranges from $251,000 to $500,000, with the contract to be awarded through an open market, competitive process. The instrument will be located at the NIST Boulder campus in building 1 and managed by the Communications Technology Laboratory, specifically within the Communications Technology Laboratory. The primary point of contact is Nathali Clark from the CHIPS organization, who can be reached at nathali.clark@chips.gov for potential inquiries about this procurement opportunity.
Forecast text
This is a CHIPS Metrology procurement that supports Project 5.04 for Grand Challenge 5, Modeling and Simulating Semiconductor Manufacturing Processes. The RF Waveform and Rapid Frequency Comb Diagnostics for Plasma Etching project team requires a new Vector Network Analyzer to develop a high-power RF waveform measurement system to monitor plasma etching processes. The data obtained, in support of NISTs mission, will be used for metrology development, including calibration practices, RF waveform measurement protocols, and hardware optimization. This instrument will reside in the NIST Boulder campus in building 1 and will be managed by the Communications Technology Laboratory.
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