Atch_01,_Fluorescent_Microscope_with_Automated_stage_Specifications.pdf

Fluorescent Microscope with Automated stage Specifications

Technology: Fluorescent microscopy for scanning of 200 mm (8 inch) semiconductor wafers

‐ Requirement: View emission from fluorescent microspheres deposited onto wafer surface.

• The wafer is opaque.

• Different colors of fluorescent microspheres will be deposited onto wafer surface in a clean room environment.

• The fluorescent microspheres deposited on one wafer will all be of the same color and size.

o Green microspheres: 468 nm excitation maxima; 508 nm emission maxima; 40 nm Stokes shift o Red microspheres: 542 nm excitation maxima; 612 nm emission maxima; 70 nm

Stokes shift o Blue microspheres: 365, 388, and 412 nm excitation maxima; 447, 447, and 473 nm emission maxima; 82, 59, and 61 nm Stokes shift o Microsphere physical diameter: 3 micrometer (micron).

‐ Requirement: Use an automated stage with scanning software to count particles on the wafer.

• The wafer will be scanned in a clean room environment.

• Hundreds of fluorescent particles will be deposited onto the wafer surface in a random pattern.

• The time to perform the automated scan of each individual wafer can be as long as multiple days.

• Use an automated stage to scan 200 mm wafer

• Use software to count the number of fluorescent beads on the wafer surface.

• Use software to provide the mean intensity of each spot.

• Use software to report data on the number of particles detected and any associated detection statistics.

• After a particle is defined in the software, the scan shall be fully automated and operate without human interaction.