68-5051-16_Technical_Specifications.docx

Specifications for Plasma Enhanced Chemical Vapor Deposition System

1. The Naval Research Laboratory (NRL) has a requirement for a plasma enhanced chemical vapor (PECVD) deposition system.

a. The primary requirement is for a PECVD system for semiconductor processing, particularly the deposition of silicon nitride and silicon dioxide films as well as mixtures of those films. Deposition of those films must be done using a Si gas source consisting of <2% SiH4 in N2. The PECVD system must be a standard commercial product with demonstrated field use.

b. The PECVD system must be able to accommodate sample sizes from 10x10 mm to a single 4” wafer. Samples smaller than a 4” wafer must be able to be placed on a carrier wafer.

c. The system must include a fully automatic single wafer vacuum load lock with pneumatic transfer arm and have a vacuum gauge that read in the 1 to 1000 mTorr range. The load lock must be pumped by a customer supplied Edwards nXDS20i pump.

d. The process chamber must have temperature control for platen and showerhead with temperatures up to 400 °C, temperature controlled walls, and an air cooled platen. Dual frequency 13.56 MHz RF and 375 kHz RF generators are required for film stress control.

e. The deposition chamber must be suitable to handle required gases and be pumped with a customer supplied Edwards iXH1210 pump. The process chamber must include throttle control valve (for example, MKS T3Bi), appropriate temperature-stable pressure gauge, view port, and end-point detector for plasma cleaning.

f. Eight appropriate mass flow controllers (MFCs) must be installed for the following gases: SiH4 (<2%) in N2, NH3, N2O, N2, Ar, Fluorine-containing gas for cleaning (such as SF6, CF4, etc.), O2.

g. All processes must be controlled by a standalone computer with a graphical user interface (GUI) on a Windows operating system. The GUI should provide users with easy creation, editing, and storing of recipes. The GUI should provide real-time process data to include, at a minimum: gas flow for all MFCs, chamber pressure, load lock pressure, temperature, 13.56 MHz RF and 375 kHz delivery and reflected powers, and process times. The system must have password protected user access control. The system must be capable of automatic operation with manual override.

h. Appropriate safety features and interlocks must be included.

i. All components prior to assembly must be able to fit on a freight elevator with door dimensions of 6’ x 7’ (width x height) and car dimensions of 7.5’ x 8’ (depth x height). Additionally all components must fit through a laboratory door of 42” x 82” (width x height). Tool should be designed to limit laboratory footprint. Total system footprint (deposition module and load lock) should not exceed 5.5’ x 3.5’ (L x W).

j. System documentation should include facilities installation manual, user guide, safety manual, maintenance manual with illustrated parts locator, system diagram, and OEM documentation.

2. Delivery must occur 12 to 14 weeks after receipt of order.

3. Installation and Training: The contractor shall provide onsite installation of the equipment and demonstrate that the system meets the required specifications. The contractor shall also provide on-site training at the time of the installation and demonstration for two NRL personnel.

4. Warranty and Support: The contractor shall offer the Government at least the same warranty terms, including offers of extended warranties, offered to the general public in customary commercial practice.