1333ND19QNB680608__SF-18_SOW.pdf

STATEMENT OF WORK

PULSE EXTREME ULTRAVIOLET LASER SYSTEM

GENERAL

All equipment and components must be commercial items used in similar or identical systems that have been delivered within the past 5 years. All equipment shall be composed of current production models and not prototypes. All equipment must be new; used equipment will not be considered. Any substitutions of normally-used major system components, such as IR lasers, power supplies, cryogenic coolers, optical components, chillers, pumps, vacuum pumps, and other equipment that is required to meet these specifications shall be clearly noted in the proposal. The term “EUV source” encompasses the entirety of the instrumentation described and specified below, which will be provided by the vendor.

1. Ultrafast, amplified, pulsed Ti:Sapphire laser, operating in the near-infrared at roughly 800 nm, abbreviated herein as the “IR laser.” The IR laser will be housed in an enclosure to minimize contamination of optics and promote temperature stability of critical components. The IR laser will be computer-controlled, thereby permitting remote alignment of optical elements, thereby minimizing the need to open the enclosure. Other specific characteristics of the IR laser will include the following:

a. It can be configured to operate at a repetition rate within the range of 5 kHz to 30 kHz, inclusive.

b. It will be optimized to operate at a pulse repetition rate of 25 kHz with a pulse duration <35 fs and pulse energy of at least 0.5 mJ.

c. Alternatively, the pump can be configured (on the customer’s site, after installation) to operate at a repetition rate of 10 kHz. In this format, the energy per pulse will be at least at least 2 mJ, and the pulse duration <35 fs.

d. Alternatively, the pump can be configured (on the customer’s site, after installation) to operate at a repetition rate of 5 kHz. In this format, the energy per pulse will be at least 3 mJ, and the pulse duration <35 fs.

e. The pump output will have a transverse mode that is nominally TEM00 with a value of M2 <1.25.

f. Pulse-to-pulse energy stability will be better than 1% rms with long-term power stability better than 1% rms over a 12 hours period after warmup.

g. Must include integrated monitoring and diagnostics for the oscillator output including a fast photodiode, spectrometer, power monitor, necessary software and computer.

h. Must include integrated monitoring and diagnostics to measure the amplifier output spectrum.

i. Requirements for house facilities, such as process gases, coolants, and vacuum lines, shall be explicitly stated.

j. Must include a cryogenic cooler and all necessary accessories (compressor, high-pressure lines, etc.) for the operation of the cryogenically cooled laser crystal.

k. Must include cryo-compressor hose extensions that allow the compressor to be placed in an adjacent room.

2. HIGH-HARMONIC-GENERATION (HHG) SYSTEM

The output of the IR laser will be directed into the HHG system. Extreme ultraviolet (EUV) light is produced and output from the HHG system when the ultrafast laser pulses interact with a select noble gas that is confined to a waveguide capillary waveguide module residing within the HHG system. Due to the special nature of the IR light-gas interaction, the generated EUV light is coherent, coaxial with the IR beam, and the EUV wavelengths occur at odd (“high”) harmonics of the IR wavelength. Specific characteristics of the HHG system will include the following:

a. The HHG system must be configured for use with Kr, Ar, Ne, and H, with the following minimum performance.

b. Must include a water-cooling device and chiller to cool the HHG cartridge.

c. HHG operation producing photon energies of 20 eV. The HHG system will produce a pulse train of EUV photons at 20 eV (roughly 62 nm) at a repetition rate up to 30 kHz. The EUV photon flux at this energy will be > 1013 photons/second as measured within a 1% bandwidth.

d. HHG operation producing photon energies of 45 eV. The HHG system will produce a pulse train of EUV photons at 45 eV (roughly 28 nm) at a repetition rate up to 25 kHz. The EUV photon flux at this energy will be > 1012 photons/second as measured within a 1% bandwidth.

e. HHG operation producing photon energies of 69 eV. The HHG system will produce a pulse train of EUV photons at 69 eV (roughly 18 nm) at a repetition rate up to 10 kHz. The EUV photon flux at this energy will be > 1010 photons/second as measured within a 1% bandwidth.

f. HHG operation producing photon energies of 95 eV. The HHG system will produce a pulse train of EUV photons at 95 eV (roughly 13 nm) at a repetition rate up to 5 kHz. The EUV photon flux at this energy will be > 1010 photons/second as measured within a 1% bandwidth.

g. Beamline for the output of the IR laser into the HHG system should be designed to be Class 1.

3. EUV BEAMLINE

The HHG system is vacuum-coupled to an interconnected, evacuated, tubular conduit, which incorporates modular components that may be optionally and readily installed (by the customer) into the beamline and HHG system, as needed--without compromising the beamline vacuum. These modules are used to reject excess IR light, filter the EUV spectrum, focus the EUV light, monitor the EUV power, replacement capillary waveguides, etc., as follows:

a. The beamline shall include a facility for inserting a mirror after the capillary and an access port that will aid in coupling the near-infrared pump light into the capillary.

b. The beamline shall include 2 IR-rejecting, EUV-passing (“rejector”) modules, which are configured for water cooling.

c. The beamline shall include a motorized toroidal mirror module with a EUV focal length of 50 cm.

d. The beamline shall include a motorized toroidal diverging mirror module with the focal length to be defined later.

e. The beamline shall include a grating module which permits spatially dispersing the

EUV spectrum such that a selected EUV order, or orders, may be chosen, by the use of pinholes, etc., placed within the beamline, and other EUV orders rejected.

f. The beamline shall include an x-ray CCD camera that will display an image of the EUV orders dispersed by the EUV grating module. The CCD camera will include all necessary electronics and modern Windows-compatible software necessary to operate the CCD camera and display a real-time image.

g. The beamline shall include 3 filter wheel modules which permit selectively blocking the EUV path with metal foil filters or apertures of various sizes; the filter wheels also serve to isolate the high vacuum portion of the beamline from the rough vacuum portion. A filter wheel module will have 4 available ports within which filters or apertures may be installed.

h. The vendor shall include at least 10 extra waveguide capillary modules.

i. The vendor will determine an optimal rejector module and beamline configuration such that sustained exposure (of at least 48 hours) of the excess IR light on the rejector element or elements will not degrade the EUV transmission or the EUV pointing stability (as described in the following items) exiting the beamline when the HHG system is set up to operate in any of the 4 IR-light configurations described above: e.g., when producing 20 eV photons at a repetition rate of 30 kHz with an EUV flux > 1013 photons/second; when producing 45 eV photons at a repetition rate up to 25 kHz with an EUV flux > 1012 photon/second; when producing 69 eV photons at a repetition rate up to 10 kHz with an EUV photon flux > 1010; when producing 95 eV photons at a repetition rate up to 5 kHz with an EUV photon flux > 1010 photon/second

j. For all cases detailed above, the EUV pointing stability shall be less than 3 micro-radians over a period of 48 hours. Additionally, for all 3 cases detailed above, the EUV flux stability shall be less than 4% over a period of 48 hours.

k. For all cases detailed above, the EUV mode quality will be near-TEM00 and the EUV beam divergence will be within the range of 0.5—4.0 milli-radians.

4. OPTICAL TABLE

The pulsed EUV source, including an IR laser, HHG system, and beamline will operationally fit on a single optical table provided by the vendor. However, the table may be composed of at most two separate tables (one for the IR laser and one for the HHG generation and beamline), securely fastened together (thus acting as a single optical table), such that the overall specifications of the EUV source are maintained. The optical table need not be rectangular but should occupy a floor space no larger than 12’ X 12’. For example, the composite table could be “L-shaped.”

Dimensions for the optical table holding the IR laser must be 4x6 ft, while the optical table holding the EUV generation and beamline must be 5x10 ft. The minimum table thickness will be chosen by the vendor such that the overall specifications of the EUV source are maintained. The table will not be necessarily pneumatically suspended, and the table support system will be chosen such the height of the table surface from the laboratory floor will be 33-5/16 inches. The top surface of the table will be drilled and tapped for ¼-20 holes on 12” centers.

5. DOCUMENTATION

The vendor will provide a complete set of electrical, vacuum, and plumbing schematics, including control schematics, and a complete set of operations and maintenance manuals.

All manuals shall be provided on CD-ROM in a common format such as PDF. Manuals shall also be included for any major third-party hardware and software.

6. PRE-SHIPMENT REQUIREMENT

Before shipping the EUV source, the vendor shall provide the Government with a factory acceptance report demonstrating that the EUV source performs according to specifications. This should include quantitative data that demonstrate that it meets all technical specifications. The Government reserves the right to be present during the factory acceptance test. The EUV source must meet the above requirements before it is shipped to NIST.

7. DELIVERY AND INSTALLATION

a. The vendor will coordinate, oversee, and pay for delivery and installation of the optical table(s). This includes coordinating, overseeing, and paying for the delivery, assembly, and joining of 2 optical tables if it is determined that a single optical table is insufficient to meet the specifications described above.

b. The vendor will coordinate, oversee, and pay for the delivery and installation of the EUV source comprising the pump, HHG system, and beamline.

c. The contractor shall be responsible for installing the EUV source in Building 81 on the NIST-Boulder campus. This is to include all required rigging from the delivery truck to final tool placement in laboratory room 1C-121 of Bldg. 81. The installation and rigging shall be performed in a method that is compatible with industry standards.

d. After installation of the EUV source, the contractor shall demonstrate that it performs according to specifications using a standard site acceptance test. The EUV source must meet the stated performance requirements before it is accepted.

e. Delivery of the complete EUV source is required; no partial delivery will be accepted.

8. OTHER

a. The RFP response shall include estimated freight charges.

b. The RFP response shall include a warranty of at least one year from the date of acceptance. The RFP response should include a full description of the terms and coverage provided by the warranty.

c. The RFP response shall include a service agreement for the first year (if this is not already covered by the warranty). The RFP response shall include a full description of the terms and coverage provided by the service agreement. The terms “service agreement” and “service contract” are variously used, have the same meaning, and are interchangeable.

d. The vendor shall have U.S.-based service technicians and U.S.-based repair facilities.

e. All equipment shall be new.

f. The system shall meet conventional standards for safety, including those related to electrical components, mechanical components, and optical components.

g. The vendor’s RFP response shall include a list of multiple, U.S.-based references of similar systems previously sold, suitable for the evaluation of past performance, system reliability, user experience, and customer support.

9. ACCEPTANCE

Within one week of the completion of the work, the vendor shall provide the TPOC a report of the work done, the results of the test before and after installation, and any issues encountered.

10. TRAINING

Upon initial installation of the EUV source, the vendor must schedule and facilitate a 3-day (minimum) training session up to 4 users at NIST. The training shall provide a thorough demonstration of all equipment functions, maintenance, data administration, and basic troubleshooting. The training may be completed at NIST immediately after installation and demonstration of performance specifications, but no later than 30 days after installation.

11. PERIOD OF PERFORMANCE

See Clause 1352.270-70, Period of Performance.

a. Delivery is within 8 to 9 months after receipt of order. Warranty is 1 year after written acceptance of the system.

12. PLACE OF PERFORMANCE

a. All work shall be performed at the 325 Broadway, Boulder, Colorado location.

b. The government will provide access to Building 81 to the vendor for the entire period of performance of this contract.

c. The day-to-day supervision and direct control over the work performed by the on-site vendor personnel shall be the sole responsibility of the vendor.

13. GOVERNMENT FURNISHED PROPERTY

Not applicable.

14. DELIVERABLES

a. Provide the Government with a draft installation manual and utility requirements along with quote response.

b. Provide evidence of experience of supplying, installing, and training new users on a Pulse Extreme-Ultraviolet Laser System with similar requirements to those in the statement of work. Evidence of this criterion shall be demonstrated with an appropriate reference.

c. Before shipping the EUV source, the vendor shall provide the Government a factory acceptance report demonstrating that the EUV source performs according to specifications. The Government reserves the right to be present during the factory acceptance test. The EUV source must meet the above requirements before it is shipped to the NIST.

d. The vendor shall provide an installation guide sixty business days after receipt of award.

e. The vendor shall supply the TPOC with a copy of a report summarizing the following items one week after their site visit:

i. work done.

ii. the results of the acceptance test.

iii. any issues identified.

15. ATTACHMENTS

None.

16. PERFORMANCE REQUIREMENT SUMMARY

Task Performance Indicators

Performance Standards Acceptable Quality Level

Surveillance Method

Assist the Government by supplying, installing, and training new users on a EUV source that meets the specifications as defined sections 1 -5.

After the EUV source is installed and tested, it meets the tool requirements described in sections 1 -5.

The technical requirements defined in sections1 -5, the vendor provides a minimum of 3 days of EUV source training and the delivery of the report described in section 6 within one week of completion.

Installation and testing of the EUV source are performed according to industry standards. After the Pulse Extreme- Ultraviolet Laser System is installed, it meets the tools’ requirements described in sections1 -5.

Visual verification of work completed and verifying the tasks in the report described in section 14 are completed.

17. WARRANTY

The warranty of the EUV source shall be for a period of not less than one year beginning at on-site acceptance. Warranty shall include unlimited telephone/email support, during the warranty period, for questions regarding operation. This warranty shall cover non-consumable parts and travel/labor on site should this become necessary within the warranty period. To minimize our expenses in case of need for service, the vendor must have North America-based service personnel, and the system purchase must include a guarantee of service support on-site within 1 week during the warranty period. To minimize time lost, during unanticipated equipment breakdown, replacement and/or loaner equipment should be made available until the full repair is possible within 21 days.

18. TRAVEL

The vendor shall be responsible for all travel expenses.

19. VENDOR SUPPLIED MATERIALS

The vendor shall supply all parts, hardware, equipment, and labor required to perform the tasks listed.

20. VENDOR SUPPLIED MATERIALS

a. The vendor shall provide personnel that passes required government background checks to be issued badges for work on-site.

b. All staff from selected vendor shall be badged by NIST Security. No one may enter the site without a badge.

c. All work shall be scheduled with the TPOC prior to arrival to do the work.

21. OPTIONS (SEPARATELY PRICED)

a. M2 diagnostic: Provide a complete M2 beam diagnostic system (including software, computer, cables, requisite optics, etc.).

b. Frequency resolved optical grating (FROG) diagnostics: Provide a complete

FROG beam diagnostic system (including software, computer, cables, requisite optics, etc.)

c. Monochromator module: Provide a module chamber capable of selecting a single harmonic after the dispersion of the different harmonics by the grating module.

d. Warranty Extension 1: The cost of one additional year of warranty following the original warranty expiration date.

e. Warranty Extension 2: The cost of one additional year of warranty following the first warranty extension expiration date.

22. CONFIDENTIALITY

The information developed under this contract is the property of the U.S. Government and shall be kept in strict confidence