Highri optics, INC will develop cutting-edge technology for instrument transfer function (ITF) calibration of extreme ultraviolet (EUV) lithographic tools to enhance the performance and precision of…

This $283,009.12 Cooperative Agreement, awarded by the National Institute of Standards and Technology (NIST) under the CHIPS Research and Development (CFDA 11.042) program, will enable Highri Optics, Inc., a woman-owned small business, to develop cutting-edge technology for Instrument Transfer Function (ITF) calibration of Extreme Ultraviolet (EUV) lithographic tools. The goal is to enhance the performance and precision of EUV equipment utilized in semiconductor manufacturing. The company plans to subaward funds to support fabrication and characterization of X-ray optical devices, as well as EUV lithography and photomask development, along with technical consulting services. This initiative aims to advance domestic semiconductor capabilities and strengthen the United States' global competitiveness in this critical technology area.

Activities

The awardee with develop cutting-edge technology for instrument transfer function (ITF) calibration of extreme ultraviolet (EUV) lithographic tools.

Expected outcomes

The proposed technology will enhance the performance and precision of extreme ultraviolet equipment.

Intended beneficiaries

Researchers and U.S. Semiconductor industry that utilizes extreme ultraviolet (EUV) lithographic tools.

Subrecipient activities

The recipient plans to subaward funds to support fabrication and characterization of x-RAY optical devices and EUV lithography and photomask development, along with technical consulting services.