Maskless Aligner Photolithography System
Awarded Award Notice Posted
- Solicitation number
- N00173-20-P-2002
- Agency
- Office of Naval Research Secretary of the Navy, Department of Defense
- Awarded
- to Heidelberg Instruments Inc.
- Set-aside
- No set-aside
Opportunity facts
- Contract number
- N00173-20-P-2002 Federal contract award
- NAICS code
- 334516 Analytical Laboratory Instrument Manufacturing
- PSC
- 6640 Laboratory Equipment And Supplies
- Place of performance
- Washington DC 20375 USA
Notice details come from SAM.gov. Updated .
About this opportunity
This Award Notice from the Department of the Navy Secretary of the Navy Office of Naval Research authorizes the Naval Research Laboratory to award a firm fixed price contract to Heidelberg Instruments Inc. for a Maskless Writer Pattern Generator through other than full and open competition procedures. The Maskless Aligner 150 lithography system, valued at $479,750, will be used in future nanoscience research at the Institute for Nanoscience Division. Only Heidelberg Instruments, Inc. is capable of meeting the required specifications for this specialized lithography equipment. The contract was awarded on March 5, 2020 under solicitation number N00173-20-P-2002.
Notice text
This Justification authorizes and approves the Naval Research Laboratory (NRL) to utilize other than full and open competition procedures in accordance with FAR 13.5 to award a firm fixed price contract to Heidelberg Instruments Inc. for a Maskless Writer Pattern Generator (Maskless Aligner 150) for the use in future research at NRL’s Institute for Nanoscience Division. Heidelberg Instruments, Inc. is the only vendor capable of meeting the Government's required specifications.
Awarded contract N00173-20-P-2002 to HEIDELBERG INSTRUMENTS INC for 479750.00 on 2020-03-05.
Attachments
| File | Type | Posted |
|---|---|---|
| Redacted JA_N0017320P2002.pdf |
Notice history
| Notice | Type | Posted |
|---|---|---|
| Maskless Aligner Photolithography System | Award Notice | |
| Maskless Aligner Photolithography System | Special Notice |
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