Electron Beam Lithographer
Closed Pre-Solicitation Posted
- Solicitation number
- 80GSFC21R0034
- Agency
- Goddard Space Center National Aeronautics and Space Administration
- Responses due
- Set-aside
- No set-aside
Opportunity facts
- NAICS code
- 333242 Semiconductor Machinery Manufacturing
Notice details come from SAM.gov. Updated .
About this opportunity
This pre-solicitation notice from the National Aeronautics and Space Administration Goddard Space Flight Center (NASA GSFC) seeks to procure an electron beam lithography system. The system must meet technical requirements including a minimum feature size of 8nm and position stability of less than 120nm over 8 hours, as specified in the attached statement of work. NASA GSFC intends to issue a sole source contract to Raith America, Inc., as they are the only company capable of meeting requirements. Interested parties may submit capabilities by September 9, 2021 for consideration of competitive procurement.
There is no set-aside designated for this procurement. The electron beam lithography system will enable advanced fabrication processes and development of detectors under NAICS code 334516, Photographic and Photocopying Equipment Manufacturing, with an anticipated PSC code for scientific instruments of J019. NASA GSFC plans to award a sole source contract to current provider Raith America, Inc., valued at an estimated amount to fulfill the government's requirements as defined in the statement of work, with delivery and installation required within one year.
Notice text
NASA/GSFC has a requirement for an electron beam lithography (EBL) system, used to define nano-sized geometric structures needed in the fabrication of advanced sensors, detectors, optical and micromachined components. The EBL consists of an electron source or gun, a column, a wafer chamber, a vacuum system, computer and associated control electronics, and an environmental chamber.
The EBL is an essential tool for advanced device fabrication projects under development and in production in the Detector Systems Branch at GSFC and is critically needed for the technology development and production of detectors such as Microwave Kinetic Inductance Detectors, Transition edge sensor detectors, and the Magnetic Calorimeters. The EBL will enable advanced fabrication process, supporting development of superconducting amplifiers and other electronic components, which are important to GSFC’s lines of business.
NASA/GSFC intends to issue a sole source contract to acquire the items from Raith America, Inc. The rationale supporting this sole source award to Raith America, Inc is in accordance with the authority at FAR 6.302-1, “Only one responsible source and no other supplies or services will satisfy agency requirements”. Raith America, Inc. is the only company capable of providing an Electron Beam Lithography System that meets all of the technical requirements in the Statement of Work (SOW).
The Government intends to acquire a commercial item using FAR Part 12.
Interested organizations may submit their capabilities and qualifications to perform the effort electronically via email to Alpana Jenne at Alpana.K.Jenne@nasa.gov not later than 3pm EST on September 9,2021. Such capabilities/qualifications will be evaluated solely for the purpose of determining whether or not to conduct this acquisition on a competitive basis. A determination by the Government not to compete this acquisition on a full and open competition basis, based upon responses to this notice, is solely within the discretion of the Government.
NASA Clause 1852.215-84, Ombudsman, is applicable. The Center Ombudsman for this acquisition can be found at http://prod.nais.nasa.gov/pub/pub_library/Omb.html
Attachments
| File | Type | Posted |
|---|---|---|
| SOW for Electron Beam Lithography tool-vs2 Final.pdf |
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