Electron-beam evaporator system

Added: Jul 01, 2015 12:40 pm PURPOSE

The National Institute of Standards and Technology (NIST), requires an electron-beam evaporator system for deposition of silicon in an ultrahigh vacuum, scanning tunneling microscope system. The electron-beam evaporator will be mounted on the preparation chamber of a QuadraProbe scanning tunneling microscope system.

TECHNICAL SPECIFICATIONS:

1. The electron beam evaporator must be capable of vapor deposition of thin layers (sub-monolayer to a tens of monolayers) of Si, via evaporation from either a rod or a crucible. The evaporator must include a shutter.
2. The system must include a power supply, which will provide all necessary voltages and currents, including high voltages as well as the filament current. The system must also include appropriate cables for connecting the power supply to the evaporator.
3. The evaporator must be capable of being cooled with chilled water circulation.
4. The evaporator must be UHV compatible. The evaporator must be mountable on a 2.75-inch Conflat (CF) flange. The vacuum side length must not exceed 220 mm. The vacuum side diameter must be less than 35 mm. The air side length must not exceed 200 mm.

DELIVERABLE SCHEDULE

The Contractor shall deliver no later than eight (8) weeks after receipt of order.