SOW for 5x_Stepper_Lithography FINAL (003).pdf

STATEMENT OF WORK FORMAT

Stepper Photolithography Tool

Background

The GSFC Detector Development Laboratory (DDL) has a requirement to acquire a 5x i-

Line Stepper Photolithography system (Stepper). The system is used to define submicron scale geometry structures in polymer based photoresists. The stepper shall align and expose patterns through a reticle transferring it onto the wafer under fabrication. The exposure shall be completed using a step and repeat pattern where a small area of the wafer is exposed followed by a new exposure at the next position of the wafer. This patterning process is continued to cover the entire wafer. The stepper shall be suitable for patterning wafers of 100, 150 and 200 mm diameter and have high resolution accuracy, repeatability of feature geometry and nanoscale registration accuracy. This is an essential tool for nearly all device fabrication projects under development and in production in the Detector

Systems Branch at GSFC. In particular, this equipment is immediately needed for the technology development and production of detectors for Cosmic Microwave Background

Polarization technology, Microwave Kinetic Inductance Detectors, Far-Infrared Detectors, X-Ray Calorimeters, Large Format Magnetic Calorimeters, and Microfluidic Components, EUV and Far-IR/Sub-mm optical components, superconducting amplifiers, and

MicroElectroMechanical Microshutters which are important to Goddard’s lines of business.

Objectives

The objective of this project is to procure a High-Resolution, i-Line lithography stepper.

Scope

The scope of this work includes production and delivery of a 5x i-Line Stepper photolithography system. The Stepper consists of an optical source and illumination system, a wafer and reticle transfer and alignment system and a housing and computer control.

Tasks or Requirements

The Supplier shall provide a new Stepper lithography tool. No prototypes, one-of-a-kind, or refurbished systems shall be considered. The unit must be a brand new production model with at least 10 similar units working in the field. The Supplier shall insure that the Stepper is equipped with the following equipment and meet the following requirements prior to Acceptance of System:

1. Stepper Overview

1.1. A brand new unit including new optical lenses are required; no used equipment or accessories, listed below, are acceptable.

1.2. The stepper shall meet current industry standard (semi S2 and NFPA 318) requirements for safety including the use of Emergency Off (EMO) panic buttons. The tool shall include the appropriate shielding and interlocks for hazardous areas, protecting the user and maintenance personal from high voltages, pneumatics, moving parts and the tool from potential service failures.

1.3. The tool shall be housed in a self-contained chamber or cabinet with main body dimensions such that it will fit on a vibration slab < 2.2m x 2.9m. The cabinet shall have removable panels that enable trained maintenance personal and

Supplier technical representatives to have access to the stepper mechanisms. The cabinet shall be less than or equal to 2.45m tall.

1.4. The weight of the Stepper shall be less than or equal to 5.8 tons.

1.5. The Stepper shall be compatible with a Class 100 clean room and all exposed parts cleaned at the factory to remove dust, grease, or debris.

1.6. The Stepper shall include all necessary software and hardware to enable automated control of alignment of wafers and reticles as well as exposure dose of the photolithography patterns.

1.7. The supplier shall provide technical support of the equipment.

2. Optical Illumination System

2.1. The stepper shall be capable of printing features on a wafer with minimum features less than or equal to 350 nm for both isolated lines and spaces and with linewidth uniformity less than 30 nm over a lot size of 25 wafers.

2.2. The Supplier shall demonstrate that the Stepper has the capability to print linewidths down to 250 nm lines and spaces at research and development speeds.

2.3. The optical system shall have a variable numerical aperture between 0.45 – 0.63 and shall expose wafers through a 6 inch reticle with a 5:1 reduction ratio.

2.4. A user selectable exposure field on the wafer shall meet the area requirements of both 22 x 22 mm and 17 mm x 26 mm. Smaller field sizes shall also be available based on reticle design.

2.5. The Stepper shall be capable of off-axis illumination including quadrapole soft and half-annular. The stepper shall have flexibility to include custom stoppers including dipole, custom annular ratio and hard quadrapole.

2.6. The optical system and wafer alignment accuracy shall meet a minimum focus alignment accuracy on the wafer surface of less than or equal to 100 nm.

2.7. The exposure system shall consist of a 2.7kW mercury lamp providing i-Line wavelength at 365 nm and illumination intensity greater than equal to

13,500W/m2. The image surface illumination intensity uniformity shall maintain

+/- 1% control accuracy and less than or equal to +/- 1% image surface illumination uniformity.

2.8. The stepper shall be capable of automatically detecting and aligning to alignment marks on the silicon wafer. Exposed image to wafer alignment tolerance shall be demonstrated less than 40 nm.

3 Wafer and Reticle handling

3.1 The production mode stepper shall be capable of throughput up to one hundred

200 mm diameter wafers per hour each with 60 exposures per wafer.

3.2 The system shall process 100, 150 and 200 mm wafer diameters requiring minimal wafer conversion time less than 2 hours by a trained user.

3.3 The stepper and additional reticle housing unit shall be capable of storing a minimum of 29 reticles within the footprint of the tool described in section 1.3.

3.4 The stepper shall be upgradeable to allow for through-silicon-alignment for front to backside alignment

3.5 The tool shall include an option to enable the user to manually align the wafer to alignment marks in the event that the automated alignment mark detection cannot detect alignment marks due to distortion low light or other process induced factors.

3.6 Test reticles shall be provided compatible with requirements for preventative maintenance and tool calibration and performance monitoring.

4 Computer interface

4.1 The Stepper shall include a computer interface for control of the system and logging of all process parameters.

4.2 The Stepper computer interface shall control all operation of the tool including exposure dose, focus, wafer alignment, mask alignment, fine alignment, prealignment, wafer load and unload and mask load and unload.

4.3 The computer interface shall provide maintenance programs for testing and recording tool functionality and performance.

4.4 The computer associated with the Stepper shall be compliant with NASA IT specifications. The supplier shall agree to work to a reasonable extent with

NASA to meet IT requirements or provide necessary information and documentation should waivers be requested.

4.5 The computer interface shall include a recipe editor. The recipe editor shall provide full automatic and manual control of all stepper features. The computer interface shall keep a log of all recipes run on the system.

4.6 The computer interface shall include a comprehensive internal hardware diagnostics system encompassing all stepper subsystems. A complete hardware/software self-test shall be executed at each user login. All faults, errors, and unusual conditions shall be logged by the control system.

4.7 Process data and equipment parameters shall be logged as a function of time by the stepper software diagnostics system.

4.8 Software shall provide onboard overlay metrology commands capable to measure box in box, or frame in frame features to determine overlay. Software shall include built in analysis methods that check for distortion, stepping precision an overlay performance.

5 Facilities

5.1 The Stepper and all required components shall operate from standard 208V/60Hz three-phase plus neutral power.

5.2 Exterior surface parts shall be clean and free of grease or dust and compatible with operation in a Class 100 cleanroom environment.

5.3 The tool shall meet performance specifications when housed in a clean room environment with nominal temperature of 23C +/- 2C, with temperature variations for 30 min not exceeding 1 degree Celsius.

5.4 The Stepper shall require clean dry air < 0.9MPa, at 378L/min, vacuum -67kPa or less, 32 L/min or more.

5.5 The Stepper shall require cooling water 0.3MPa gauge pressure, temperature 15 –

30C, flow rate, 8 – 25L/min) respectively.

5.6 The stepper shall require illumination exhaust 7 – 8.4 m3/min 3.3kW or less at -

300Pa or less.

5.7 The Supplier shall provide shipping and crating information as well as engineering drawing information for required GSFC facilities hookups. The

Supplier shall provide engineering drawings for requirements of assembly area if the tool requires on-site assembly prior to installation. The supplier shall communicate facilities installation requirements to GSFC technical representative including electrical power, gases, vacuum and other utilities needed for operation

6 Installation and Training

6.1 The price of the system shall include installation and calibration at GSFC.

Installation shall include a demonstration that the tool is within compliance and within specifications.

6.2 The price of the system shall include crating and delivery of the instrument to

Goddard Space Flight Center along with any customs or tariff fees.

6.3 The contractor shall provide oversight of GSFC supplied rigger for movement of stepper equipment into laboratory.

6.4 The supplier shall provide all necessary labor and personnel for installation and parts assembly of the Stepper at GSFC. GSFC technicians shall provide all facilities connections for the tool as specified by the supplier.

6.5 The Supplier shall inform GSFC of the required number and sizes of wafers as well as photoresist process requirements and metrology requirements for onsite testing and verification of conformance at least 45 days prior to delivery of the system.

6.6 At the completion of installation and demonstration, the Supplier shall provide on-location operational training to at least 3 GSFC engineers at GSFC.

7 Documentation and Warranty

7.1 A full set of all written documentation shall be provided. This shall include user manuals or equivalent as well as copies of any software, and any manuals for the software included with the system. This documentation shall be received by

GSFC with the system hardware.

7.2 The Supplier shall offer GSFC at least the same warranty terms, including offers of extended warranties, offered to the general public in customary commercial practice. Warranty terms shall be included in the system price. The period of warranty will begin upon installation of the system.

The Supplier shall assemble and install the system on-site at GSFC’s Detector

Development Laboratory or another, designated, laboratory in NASA/GSFC’s Building

30 and provide operator training of the system. Together with GSFC technical personnel, the Supplier shall review the system, demonstrate and confirm that the system functions properly based on the specifications above.

Supplier shall provide a Warranty of at least 12 Months (Parts and Labor), guaranteed to meet factory specifications.

Installation and training shall be performed by a contractor factory trained technician at

NASA/GSFC.

Deliverables or Delivery Schedule

Deliver complete specified system (as described above) and in accordance with the below deliverables table.

Item No. Deliverable Delivery Date Delivery Method

1 Final design configuration of

Stepper

10 days after contract award

Electronic Format/

Contracting Officer’s

Representative (COR)

2 Functional test of 5x i-Line

Stepper Photolithography tool at contractors facility

10 months after contract award

Electronic

Format/Contracting

Officer’s

Representative (COR) with in-person trip contractor facility to verify the test.

3 Crate and Ship approved tool 1 month after acceptance of functional test

GSFC, Bldg 30, 8800

Greenbelt Road, Greenbelt, MD 20771

4 Assembly, installation and acceptance Test of Tool at

GSFC facility

2 months after delivery of tool to

GSFC

Demonstration of performance functionality at GSFC facility

5 User Training for stepper tool operation

2 months after delivery of tool to

GSFC

Demonstration by technician at GSFC facility

Government-Furnished Equipment and Government-Furnished Information

No Government-furnished equipment (GPE) and Government-furnished information

(GFI) will be required

Security

The Supplier will make every effort to provide a US Citizen for the installation and training at GSFC. If a US citizen is not available and a foreign national is required by the supplier to assist in the onsite installation at GSFC, the Supplier shall provide security information for badging purchases to NASA at least 30 days prior to expected visit.

Foreign nationals shall not work hours outside of 9am to 5pm on GSFC Center and shall not be granted access for more than 30 days in a calendar year.

Place of Performance

The construction of the Stepper shall be performed at the Supplier’s facilities.

The Final Acceptance, Installation and Training shall be performed at NASA/GSFC, Greenbelt, Maryland.

Period of Performance

13 months after contract award.