Amendment_002 _FormSF30.pdf

Attachment Page

PAGE 2 OF 2 SB1341-16-RQ-0652/002

Attachment D - RFQ Question/Inquiry Submittal Form

REFERENCE

QUESTION GOVERNMENT RESPONSE

Page Section Para.

1 E 43 G 2 No.

2 E 43 J 6 No.

3 E 43 J 8

4 E 44 L 3.b Please explain the requirement for a negative bias?

5 C All No.

6 B All No.

Question No.

RFP

Attachment

No.

Is the minimum maximum pressure of 50 Pa typographical error that should really be 500 Pa?

Is the negative tilt requirment of -2 degrees a typographical error that should really be -20 degrees?

Please explain the intended usage of 100 nm minimum step size? Can you specify the desired/required stage positioning precision (e.g.

positioning repeatability), which is a more typical stage specification?

Minimum step size refers to the smallest step over which the stage can be moved in X, Y, or Z; that specification is 100 nm or smaller. Positioning repeatability, or precision, of the stage refers to the ability to return to a previously-used position;

there is no specification for stage positioning precision.

The purpose for a negative bias is to operate in a "reflected" electron mode, wherein low-energy electrons are repelled, while higher-energy electrons such as backscattered electrons are detected.

We request that a list of references replace Attachment C. Our reasoning is that the nature of this solicitation is to purchase an off the shelf microscope. The subject matter of Attachment C is to provide feedback on a construction project making more than half of the questions on the document do not apply and are subject to interpretation.

We request that a configuration description for each refence replace Attachment B. Our reasoning is similar to the question about Attachment C more than half of the question fields do not apply. There is dupilcation of information in Attahcment B and C, we will provide information about the same microscope(s) for both forms.