Specifications.pdf
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- Attached to
- Maskless Aligner Photolithography System Federal contract opportunity
- Solicitation number
- N00173-19-Q-CM08
About this file
This document outlines specifications for a maskless writer photolithography system to be installed at the Naval Research Laboratory. The Navy intends to award a sole source contract to Heidelberg Instruments Inc. for the maskless writer, which must have a minimum feature size of 0.6um, write area of 150x150mm or larger, substrate size from 5x5mm to 6x6 inches, and line width variation no greater than 100nm. It should include integrated software, Windows 10-based interface, autofocus capabilities, alignment accuracy under 1um, and throughput of around 285 mm2/min. The vendor will provide training, a one year warranty, and service support. Responses from alternative sources must be submitted within 15 days demonstrating ability to meet requirements.
Minimum Specifications for the Maskless Aligner
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Specifications for NRL Nanoscience Institute Mask-less Writer – 08/05/2019
Section 1. General Requirements
1.1 Scope. - This specification describes the minimum technical requirements and the minimum acceptable performance standards for a Mask-less Writer to be installed by the Vendor in building 250 room 100 at the Naval Research Laboratory (NRL), Washington, DC. The Mask-less Writer will be placed in a multiple user cleanroom facility and must provide ease of operation and safety to those in the facility.
1.2 Installation Site. - The Vendor shall install the Mask-less Writer, at Naval Research Laboratory, Washington DC 20375, in building 250 room 100 NSI clean room at a specific location to be designated by the Contracting Officer's Representative (COR). The Vendor shall install the Mask-less Writer in a manner consistent with typical clean-room operating procedures.
1.3 Description and Primary Mask-less Writer Components. - The Mask-less Writer must meet the specifications as indicated in the system specifications section of this document. The Mask-less Writer is to be installed within a Class 100 clean room. It is intended for use by multiple users within that site. Therefore, it must be computer controlled via menu-driven user friendly software and be user friendly.
1.4 Existing DLW-88 mask writer
The new Mask-less writer will replace the current mask writer system. The new system will fit in the same location and foot print. The old system will be taken in trade and removed from NRL
Section 2. Mask-less Writer Requirements
2.1 Integrated software with 5-seat license for automated measurement recipes and analysis, compatible with existing in situ Mask-less Writer data analysis/modeling. The analysis software package provided will have a demonstrated record as one of the best for both ex situ and in situ data acquisition/analysis. It will have extensive software manuals with many data analysis examples.
2.2 An operating system providing a Windows™ 10 -based environment for operator interface of process control. Real time data logging of process parameters, machine status and recipe management. System must provide a user logon / password control entry.
Section 3. Minimum system specifications:
3.1 Minimum feature size 0.6um.
3.2 Write Area 150x150mm2 or larger.
3.3 Minimum substrate size 5x5mm2.
3.4 Maximum substrate size 6”x6”.
3.5 Substrate thickness: 0.1 to 12 mm.
3.6 Interferometer resolution for substrate positioning 10nm.
3.7 Line width variation [3s] no greater than 100nm within 150x150mm2 write area.
3.8 Pneumatic (air-gauge based) autofocus system.
3.9 Optical autofocus system.
3.10 Front side alignment accuracy better than 500 nm.
3.11 Back side alignment accuracy better than 1um.
3.12 High throughput of ~285 mm2/min at 0.6um resolution (feature size).
3.13 Draw Mode feature that allows the user to draw geometries or load small bitmaps that can be placed into the camera view screen and then exposed.
3.14 Automatic labeling and serialization feature that provides the user the ability to add a list of positions and texts for the serialization of individual Dies.
3.15 Advanced alignment capabilities that allows the user to use multiple alignment marks to correct the design data for runout, skew, and orthogonality errors.
3.16 Overview camera with a large field of view, to make the process of finding the alignment marks simple.
3.17 Two diode lasers, one at 375nm at 2.8W and one at 405nm at 8W, installed simultaneously.
3.18 High Aspect Ratio Mode that allows the system to change the depth of focus by adjusting an aperture, allowing optimization of sidewalls in thick photoresists.
3.19 Gray Scale Exposure mode with 128 intensity levels controlled by BMP or DXF patterns.
Section 4. Options
4.1 Front side alignment accuracy that can be increased to better than 250 nm.
Section 5. Training
5.1 Vendor will provide Mask-less Writer hardware familiarization.
5.2 Vendor will provide system operator training concurrent with system acceptance.
5.3 Vendor will offer on site and off site class room training.
Section 6. Warranty and Support
6.1 Vendor shall provide a twelve (12) month warranty from the date of installation acceptance at the NRL site, including all parts and labor with 24-hour telephone response with 3 day or less on site response once breakdowns are confirmed.
6.2 Vendor shall demonstrate field service support infrastructure.
Section 7. Documentation
7.1 Vendor shall provide electronic copies of the following:
a) Full operating instructions suitable for use in teaching new users.
b) Electrical wiring schematics.
c) Complete mechanical schematics suitable to guide future modifications and repairs.
d) Trouble shooting manual for common servicing and repairs of electrical, mechanical and computer software problems.
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