This Project Grant award from the National Science Foundation's (NSF) Mathematical and Physical Sciences (MPS) program provides $250,000 to Texas Tech University System to develop a high-throughput reactive printing technique for synthesizing and studying the thermal stability of solid-solution metal chalcogenide materials. The key products and services to be delivered under this 2-year award include:
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Developing a combinatorial reactive printing method to rapidly screen and optimize the composition of chalcogenide alloys for improved thermal stability. This will enable understanding of how elemental modulation impacts the thermal degradation pathways of these materials.
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Conducting advanced characterization and machine learning analysis to identify the critical factors limiting the chemical stability of printed chalcogenide thin films under extreme temperature conditions.
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Integrating the research findings into educational outreach programs to provide hands-on STEM research experience and career preparation for underrepresented minority students in the local and rural West Texas region.
The award period runs from August 1, 2024 to July 31, 2026. This work aims to advance the development of thermally resilient chalcogenide semiconductors for energy conversion and data storage applications.
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