This $965,000 Project Grant award from the National Science Foundation (NSF) Integrative Activities (CFDA 47.083) program supports Vanderbilt University's acquisition of a state-of-the-art 50-kV electron beam lithography (EBL) tool. The EBL instrument will be housed within Vanderbilt's Cleanroom, a shared-use facility that serves multiple universities including Historically Black Colleges and Universities (HBCUs) in the Southeast U.S. region. This advanced EBL system will enable high-speed, ultra-high-precision nanoscale lithography, enabling a broad range of research projects at Vanderbilt and its partner institutions. The award has significant broader impacts, as the EBL tool will provide hands-on training for undergraduate and graduate students, contributing to the future semiconductor, photonics, and quantum science workforce. Additionally, the project aims to attract diverse faculty, postdocs, and students, aligning with NSF's goals of broadening participation in STEM fields.