Under a $425,448 Project Grant from the National Science Foundation (NSF) Division of Chemistry, the University of Florida is conducting collaborative research on electron-induced reactivity of organometallic precursors for focused electron beam-induced deposition (FEBID) and extreme ultraviolet (EUV) lithography resists. This 3-year research effort, in partnership with Johns Hopkins University, aims to develop a holistic understanding of electron interactions with organometallic complexes to improve these nanofabrication techniques. The project will identify key structure-reactivity relationships, utilize surface science studies, and generate new knowledge to advance FEBID as a robust nanofabrication process and support the development of next-generation EUV photoresists for the semiconductor industry. The research team will disseminate findings through scientific publications, conference presentations, and public outreach activities to communicate the real-world applications of this chemistry-based nanoscience.
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