Project Grant 2350338

This Project Grant award from the National Science Foundation (NSF) Engineering program (CFDA 47.041) provides $466,735 to the University of Maryland, College Park to conduct fundamental research on electron beam-induced atomic layer etching (EB-ALE) for advanced materials processing. The project aims to develop the scientific understanding of EB-ALE, which uses a remote plasma source to chemically modify a material surface followed by electron beam irradiation to induce layer-by-layer etching without the atomic displacement damage associated with direct plasma-based methods. The research will explore the surface chemical and physical aspects of the EB-ALE process, including the dissociation of precursor gases in the remote plasma and the etching behavior as a function of electron beam parameters and surface modifications. The goal is to enable atomic-scale precision in etching complex multi-element materials for critical applications in microelectronics, quantum technologies, and renewable energy. This 3-year award will provide unique educational and training opportunities for students, faculty, and underrepresented groups involved in the collaborative academic-industry project.