This National Science Foundation Project Grant of $413,362 will support the development of new area selective deposition methods for the low-temperature photoassisted chemical vapor deposition of metals onto functionalized thermally sensitive materials from September 1, 2022 to August 31, 2025. Funded under the Mathematical and Physical Sciences program (CFDA 47.049), which aims to promote progress in these fields and strengthen the nation's scientific enterprise, researchers at the University of Florida will work to design photoactive precursors that selectively deposit metals only in desired surface areas. Specifically, the researchers will employ self-assembled monolayers patterned for growth versus non-growth to quantitatively study precursor-molecule interactions and achieve area selective deposition, a critical capability for technologies such as energy harvesting, sensing, and organic electronics.
Mod # | Description | Reason For Modification | Federal Obligation (Click to sort descending) | Date (Click to sort ascending) |
|---|---|---|---|---|
| Not listed | $413.4k | 7/18/22 |