This Project Grant award from the National Science Foundation Division of Physics, totaling $1,093,132, will support the development of multiscale modeling and particle-in-cell simulation techniques to optimize plasma-based magnetron sputtering devices. Funded under the Mathematical and Physical Sciences program (CFDA 47.049), this award to The Regents of the University of Colorado from July 2022 to June 2025 aims to advance clean energy and electronics manufacturing technologies. Specifically, the University of Colorado will develop speed-limited particle-in-cell and other plasma modeling methods to enable more efficient exploration of magnetron sputtering design changes. Magnetron sputtering is used to produce thin film coatings essential for integrated circuits and solar cells. Controlling the plasma density, energy, and ion distribution through improved simulation tools could lead to more reliable, higher-quality and lower-cost coatings.
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