Statement_of_Work-complete_20220811190343.640_X.docx

STATEMENT OF WORK

1. Objective/Requirements NASA Langley’s ISO 5 (Class 100) cleanroom at the Langley Research Center in Building 2104, supporting work currently being done in RD/ED/SD that directly support NASA’s missions in space, science, and aeronautics. This cleanroom requires the DWL 66+ laser lithography system to replace and continue the work of the existing the current Heidelberg DWL 66FS.

2. Characteristics, Scope, and Specs The specifications for the Maskless Lithography System shall meet the following requirements:

· Environment chamber for stable environment of the system:

· laminar airflow (adjustable): 0.3 – 0.5 m/s

· temperature stability: ± 0.1 °C (at ±1ºC outside the box)

· air quality: ISO 4 (if clean room is ISO 5 or better)

· Base granite with air cushions for vibration isolation

· Optical system including highly reflective mirrors and acousto-optic modulators for real-time beam correction

· Stage system with linear motors, position control by interferometer, and vacuum chuck for various substrate sizes:

· maximum substrate size: 9” x 9”

· minimum substrate size: 5 x 5 mm²

· maximum write area: 200 x 200 mm²

· substrate thickness: 0 to 12 mm

· interferometer resolution: 10 nm

· Overview camera with 8 x 10 mm² field of view for easy alignment to marks and orientation on the substrate

· Integrated camera system for substrate inspection and automatic alignment

· Metrology system for automatic measurement and analysis of line widths, position, edge roughness, and overlay accuracy.

· Manual, semi-automatic, and fully automatic alignment

· Online beam correction and automatic design scaling for improved position accuracy and layer to layer alignment

· Standard Gray Scale Exposure Mode with 128 levels

· Real time air-gauge autofocus with dynamic range of 80 µm (requires 5 mm distance to edges of substrate)

· System control electronics and real-time software (OS9) for interferometer, stage and autofocus system, a real-time pixel generator, and image processing hardware

· Two state of the art PCs for system control (MS Windows) and data conversion (Linux)

· Conversion software for DXF, CIF, GDSII and Gerber files + State of the art design software “LayoutEditor”

· 1300mm x 1100mm x1940mm to fit inside the cleanroom in B2104.

3. Place of Performance Ship To:

ATTN: Hyun Jung Kim, Ph.D.

National Aeronautics and Space Administration Langley Research Center 4 South Marvin Street (Bldg. 1206) Hampton, VA 23681-2199

Stored At:

Building 2104, room 109 at NASA Langley Research Center in Hampton, Virginia.

Install performed by: Heidelberg Instruments, Inc.

No other GFP requirements necessary

4. Period of Performance Estimated delivery: 6 months ARO