PR 1300909664 -- Minimum Technical Specifications - revised.docx

MINIMUM TECHNICAL SPECIFICATIONS

HIGH RESOLUTION GRAZING INCIDENCE THIN FILM DIFFRACTOMETER SYSTEM

I. INTRODUCTION

The Naval Research Laboratory has a requirement for a High-Resolution Grazing Incidence Thin Film Diffractometer, Washington, DC. This system will be used to measure the structural properties of materials under controlled temperature conditions and automatically map properties at ambient conditions across standard 4” semiconductor wafers. The system shall allow for safe and easy operation for the users and other occupants of the facility.

Used equipment in whole or in part IS NOT acceptable in the purchase of this system.

The primary components of the system include X-ray source, Goniometer, Optics, Sample stages, Non-ambient sample stages, Detectors, Measurement/ Application software.

II. GENERAL REQUIREMENTS

• The system shall completely houses electronics, generator, and goniometer in one unit.

• The system shall be able to accommodate an internal cooling unit.

• The system shall support network/internet based remote operation/maintenance.

• The system shall provide a computer based on a Windows 10 operating system for instrument control and data processing.

• The system shall provide alignment-free switching of all beam path components including X-ray tube, all optical components, all sample holders (ambient and non-ambient), and all detectors.

• The system shall be capable of fully automatic, motorized switching between Bragg-Brentano, parallel beam, and high resolution XRD (monochromator) geometry without the need of touching the instrument.

• The system shall have true plug and play functionality by fully automatic, real-time component recognition and configuration as well as conflict detection for all beam path components.

III. PRIMARY COMPONENTS

A. X-RAY SOURCE

· X-ray source shall be rotating anode-based generator in order to achieve highest intensity.

· The rotating anode X-ray generator shall fit in the diffractometer cabinet and shall be fully integrated into the measurement software.

· The rotating anode X-ray generator shall have at least 5 kW capability.

· The system shall support the kV and mA settings that can be continuously adjustable via software.

· The measurement software shall support automatic startup for X-ray tubes for maximum lifetime and an automatic burn-in routine for new X-ray tubes.

· The rotating anode shall deliver a focal spot brightness larger than 5.5 kW/mm2.

· Available X-ray tube anodes shall include Cr, Co, Cu and Mo radiation.

· The system shall provide fully automated, real-time recognition and configuration of all X-ray tubes.

· Two Cu anode assemblies shall be included.

B. GONIOMETER

· The goniometer shall be vertical with theta-theta geometry.

· The goniometer shall be equipped with independent stepper motors and optical encoders on both goniometer circles (Tube- and Detector-side).

· The goniometer shall have an angular range of 360° (without accessories).

· The goniometer shall have minimum angular measurement range of -90° < 2theta < 150° (depends on accessories).

· The goniometer accuracy is equal or better than +/- 0.007° 2theta over the entire angular range.

· The goniometer shall be vertical with theta-theta geometry and shall have an additional axis to rotate the detector arm out of the coplanar geometry. This 3-circle goniometer enables application in non-coplanar geometry, e.g. in-plane diffraction experiments.

· The position of the axis of the non-coplanar arm shall be controlled by a direct angular encoder which has a resolution better than 0.002°.

· The minimum step size of the non-coplanar arm shall be equal to or better than 0.001°.

· The positioning accuracy of the non-coplanar arm shall be equal to or better than +/- 0.003°.

· The track of the non-coplanar arm shall be equipped with a distance-detection system for the automated determination of the detector position

· The minimum accessible angular range of the non-coplanar arm shall be -3°< 2Theta(nc) < 150°.

· The sample-to-detector distance on the non-coplanar arm shall be variable continuously with a possible maximum distance of more than 350 mm.

· Angle positioning: Stepper motors with optical encoders for optimum scanning speed and positioning precision

· Minimum angular speed: 20°/s

· The minimum step size shall be 0.0002°

· The reproducibility shall be +/- 0.0002°°

C. OPTICS

· One optic module shall provide switching between a) motorized slit for powder diffraction, b) mirror (parallel and focused beam) for grazing incidence diffraction or Reflectometry and c) a high-resolution beam path consisting of mirror and 2-bounce channel-cut monochromator shall be fully software-controlled. No alignment is required when switching between these beam paths.

· Shall have Axial and Equatorial soller slits for Bragg Brentano powder diffraction and beam conditioning for in-plane grazing incidence diffraction.

· The 4-bounce monochromator shall be included in the system and its beam divergence shall be less 0.0035 degrees.

· Shall have Large FOV Equatorial and Axial soller slits (0.1 mm – 1.0 mm) at least 20 mm x 20 mm in size for GID and IP-GID measurements.

· The system shall provide collimators longer than 70 mm with various diameters (0.1, 0.3, 0.5, 1.0 mm) and these collimators can be mounted at the optical bench with motorized absorber exchange with 4 positions.

· Exchange of all optics shall be tool-free.

· The system shall offer fully automatic, real-time recognition and configuration as well as conflict detection for all optical components.

D. SAMPLE STAGES

· The system stage shall be a Centric Eulerian Cradle with motorized X-Y-Z, Chi and Phi drives. This stage shall accommodate domed non-ambient stages without losing any translational functionality.

· The system stage shall have X-Y drives at least 80 mm and Z drives at least 1 mm.

· The system stage shall have Chi drive: > 90 degrees

· The system stage shall have hi drive: Unlimited rotation

· The system stage’s Maximum sample height shall be at least 30 mm.

· The system shall provide a 5” vacuum chuck stage that can be enable unlimited rotation of phi. Vacuum chuck is recommended but is not necessary if the other wafer securing system is provided.

· The system shall offer a motorized tilt stage with at least +/- 5 degrees tilt in orthogonal directions which allows sample normal to be aligned for IP-GID measurements.

· The system stage shall A small film stage with a single vacuum opening to accommodate very small sample (<5 mm) without contributing to background.

· All sample stages shall be be exchanged without alignment.

· System shall offer ambient stage that can hold a standard 4” semiconductor wafer

E. NON-AMBIENT SAMPLE STAGES

· The supplier shall be able to offer non-ambient chambers. for low- and high-temperature measurements.

· Non-ambient sample stages shall be fully integrated into the supplier’s measurement software. The following parameters shall be controlled by the software: Heating, cooling, humidity, sample rotation, sample height adjustment, as applicable.

· All sample stages can be exchanged without alignment.

· The system shall include a cooling stage for measurement to liquid nitrogen temperatures. This stage shall include at least two extra electrical feedthroughs to apply an E-field to the sample. Stage shall operate from liquid nitrogen temperature (-180C) to above room temperature (500C) in a high vacuum environment.

· The system shall include a heating stage for measurements to higher temperatures in a vacuum environment with fully integrated (non-modular) heating filaments from 25C to 1100C with a sample sized at least 10mm x 10mm x 2mm.

F. DETECTORS

· The system shall offer fully automatic, real-time recognition and configuration of all detectors. Only 1 detector is required for all applications for ease of use and efficient reconfiguration.

· The detector shall be 0D/1D/2D position-sensitive detector based on hybrid photon counting pixel technology for Cr, Co, Cu, Mo and Ag radiation.

· Active area shall be at least 2,500 mm^2 to capture all scattering features in diffraction space.

· Pixel size of the detector shall be <100 microns to achieve sufficient resolution.

· The detector operation shall be media-free, and does not require water-cooling or pressurized dry-air purge.

· The sample-to-detector distance shall be variable continuously with a possible maximum distance of more than 350 mm to optimize angular resolution versus coverage.

· Detector position shall be automatically recognized in real-time by the software and the corresponding calibration files shall be automatically selected.

· A single detector mount shall incorporate the functionality to rotate the detector, tool-free, in order to optimize angular coverage in gamma direction or 2Theta direction, and shall recognize the detector orientation in real-time.

· The detector shall provide more than 500,000 pixels.

· The detector shall offer a count rate capability higher than 3.5 x 108 ph/s/mm².

· The detector shall be able to combine with axial Soller collimators wider than 75 mm in 2Theta direction for high quality, high speed data collection in 1D mode. The axial Sollers can be mounted tool-free and recognized in real-time.

G. MEASUREMENT AND APPLICATION SOFTWARE

· The measurement software shall have a graphical instrument representation for real-time display of the actual instrument configuration based on component recognition, real-time validation and conflict detection, and measurement planning (definition of instrument parameters such as slit settings, selection of optical components, and selection of diffractometer geometry.

· Software shall support variable measurement parameters such as variable counting time, variable step-size, simultaneous variable counting time and variable step-size support.

· Software shall support graphical interpretation of phase, RSM and XRR mapping of a 4” wafer.

· Software shall be able to control measurement position across full 4” sample stage.

· Software shall include automated data fitting of XRR data via graphical user interface that is integrated with stage position via motion control software.

· Software shall support Rietveld/Whole powder pattern fitting analysis.

IV. REQUIRED APPLICATIONS

The diffractometer, with measurement and application software packages, shall be configured for all diffraction-based material research applications including:

· Qualitative and quantitative phase analysis and phase identification

· Ab-initio crystal structural determination and refinement

· X-ray Reflectometry

· Grazing Incidence Diffraction

· In-Plane Gracing incidence Diffraction

· Gracing Incidence Small Angle X-ray Scattering

· High-Resolution X-ray Diffraction

· Reciprocal Space Mapping

· Microdiffraction

· Stress and Texture Analysis

· XRD measurements at non-ambient conditions (variable temperature and humidity)

V. FACILITY WORK REQUIREMENT SHEET

· The vendor shall provide a facility work requirement sheet, including electric power, system cooling water and process gas and gas lines with its proposal. All facility site preparation requirements and customer responsibilities and assumptions shall be submitted with the technical proposal.

VI. INSTALLATION

· The contractor shall install the system at Naval Research Laboratory (NRL), at a specific location to be designated by the Authorized Government Representative (AGR).

VII. WARRANTY AND MAINTENANCE

· The contractor shall provide warranty and at least one (1) preventative maintenance visit.

VIII. TRAINING

· The contractor shall provide two (2)-days, ON-SITE training, at the Naval Research Laboratory, in Washington, DC, for two people, after installation.

IX. OPTION FOR OFF-SITE TRAINING

· OPTION — The contractor shall provide two (2)-days OFF-SITE training course for two people, to explain all applications, within 1 year from installation date.

PR 1300909664— HIGH RESOLUTION GRAZING INCIDENCE THIN FILM DIFFRACTOMETER Page 6 of 6