A-2_Draft_Specs.pdf

PDF 19 KB Posted

Attached to
3D Laser Lithography System Federal contract opportunity
Solicitation number
NB680000-18-02223
Issued by
Department of Commerce National Institute of Standards and Technology

About this file

Draft Specifications

View the file

Other files for this federal contract opportunity

Other files attached to 3D Laser Lithography System, newest first.
File Type Posted
Draft_AMENDMENT_Specs.pdf PDF

On GovTribe

Work with this file on GovTribe

  • Download the original file
  • Contacts named in this file
  • Similar government files
  • Ask GovTribe AI about this file

Text version

DRAFT ONLY-SPECIFICATIONS

3D Laser Lithography System

Background:

The 3D laser lithography system will be used to fabricate novel micro- and nano-scale structures for several ongoing research projects in the Boulder Microfabrication Facility (BMF) at National Institute of Standards and Technology (NIST). One of the most critical applications is the fabrication of fiber-to-waveguide optical coupling solutions with high efficiency, allowing straightforward testing of numerous devices in cryogenic environments. These structures, which may incorporate overhangs and curved surfaces, are normally difficult to fabricate with conventional “planar” processing equipment such as electron beam lithography or optical steppers. To faithfully reproduce the required designs, a high-power pulsed laser source must be translated with respect to a sample stage in three dimensions with extremely high precision and repeatability. This positioning accuracy is a crucial performance metric for considering the best solution.

Technical Requirements:

The contractor shall provide a 3D Laser Lithography System with the following specifications:

1. Shall include a laser source satisfying these minimum specifications: have a dual output configuration for both 1040 nm and 520 nm wavelengths, with average power of > 8 W at 1040 nm wavelength, average power of > 4 W at 520 nm.

Both outputs shall have a pulse duration < 400 fs. The laser source must include appropriate cooling equipment as needed.

2. Shall include laser power monitoring and control equipment.

3. Shall include an air focusing 40X objective with Numerical Aperture (NA) >=0.75 for high resolution writing and a lower magnification objective for lower resolution high volume writing.

4. Shall include motion stage and a computer-controlled stage controllers to allow a working area of >= 150 mm x 150 mm, and a minimum working height >= 4

mm. Working dimensions imply that structures may be patterned within this area with the nominal positioning accuracy achievable anywhere in the volume.

5. Shall have stage positioning resolution < 500 nm in all dimensions.

6. Shall include a cleanroom-compatible vibration-isolated table, with wheeled legs.

7. Shall include (in the total cost) the choice of three additional repetition rates for the laser (within the range of 1 Hz to 1 MHz), to be decided by NIST once the contract is awarded.

3D Laser Lithography System

8. Shall include a laser safety enclosure that completely blocks the laser source from exiting the safety enclosure while the laser is powered on. An interlock must block the laser beam if the sample access door is opened.

9. Shall include a CMOS camera, a light-emitting diode illumination source, and appropriate optics to enable reflectance microscopy and real-time monitoring of the sample being written. Must provide raw video output from the CMOS camera for access by the end user.

10. Shall include a Windows computer (with Windows 7 or Windows 10) with pre-installed software capable of accepting user input design files and translating that into a series of stage motion directions and laser modulations, to achieve arbitrary 3D structures. Software must be capable of accepting designs that span the entire working volume. Future software upgrades must be included at no additional cost.

11. Shall achieve better than 2 microns lateral resolution when writing 3D shapes in SU-8 polymer, and 1 micron depth resolution, while using the 40x, 0.75 NA air objective.

Delivery:

The Contractor shall deliver an operational 3D Laser Lithography System including all of the items specified above to NIST, 325 Broadway, Boulder CO 80305. Delivery shall be FOB Origin and take place within 16 weeks ARO.

Installation:

The Contractor shall install the 3D Laser Lithography System within 2 weeks after shipping. NIST will ensure that all appropriate utilities are in place for the installation.

Testing and Acceptance:

The Contractor shall demonstrate that the laser meets all of the specifications above. The Contractor shall demonstrate that the system is capable of meeting Specification 11 above (2 micron lateral resolution in SU-8 and 1 micron depth resolution).

Warranty:

The Contractor shall provide a minimum 1 year warranty on all parts and labor included in the system above.

Background:
The 3D laser lithography system will be used to fabricate novel micro- and nano-scale structures for several ongoing research projects in the Boulder Microfabrication Facility (BMF) at National Institute of Standards and Technology (NIST). One of the...
Technical Requirements:
The contractor shall provide a 3D Laser Lithography System with the following specifications:
1. Shall include a laser source satisfying these minimum specifications: have a dual output configuration for both 1040 nm and 520 nm wavelengths, with average power of > 8 W at 1040 nm wavelength, average power of > 4 W at 520 nm. Both outputs shal...
2. Shall include laser power monitoring and control equipment.
3. Shall include an air focusing 40X objective with Numerical Aperture (NA) >=0.75 for high resolution writing and a lower magnification objective for lower resolution high volume writing.
4. Shall include motion stage and a computer-controlled stage controllers to allow a working area of >= 150 mm x 150 mm, and a minimum working height >= 4 mm. Working dimensions imply that structures may be patterned within this area with the nominal...
5. Shall have stage positioning resolution < 500 nm in all dimensions.
6. Shall include a cleanroom-compatible vibration-isolated table, with wheeled legs.
7. Shall include (in the total cost) the choice of three additional repetition rates for the laser (within the range of 1 Hz to 1 MHz), to be decided by NIST once the contract is awarded.
9. Shall include a CMOS camera, a light-emitting diode illumination source, and appropriate optics to enable reflectance microscopy and real-time monitoring of the sample being written. Must provide raw video output from the CMOS camera for access by...
10. Shall include a Windows computer (with Windows 7 or Windows 10) with pre-installed software capable of accepting user input design files and translating that into a series of stage motion directions and laser modulations, to achieve arbitrary 3D s...
11. Shall achieve better than 2 microns lateral resolution when writing 3D shapes in SU-8 polymer, and 1 micron depth resolution, while using the 40x, 0.75 NA air objective.
Delivery:
The Contractor shall deliver an operational 3D Laser Lithography System including all of the items specified above to NIST, 325 Broadway, Boulder CO 80305. Delivery shall be FOB Origin and take place within 16 weeks ARO.

File details come from the government source that posted it.