SpecificationsSOW.docx

Excimer Laser Annealing System Requirements

Required Laser Performance Specs

· Wavelength (gas species): 308 nm (XeCl)

· Pulse output energy: above 300 mJ

· Pulse duration: 30 ns FWHM

· Pulse rep rate: up to 10 Hz

· Average output power: up to 3.5 W

· Endurance (lifetime of laser in terms of number of pulses fired): above 100 million shots Required Integrated Optical Beam Delivery System Specs (optical table, attenuator, turning mirrors, homogenizer, focusing lenses, beam shutter, motion stage, etc.)

· Demagnification: 4x

· Field size (on plane of target substrate): 5x5 mm2 or above

· Post-optical system fluence: above 600 mJ/cm2

· Attenuation range: 10 – 100 %

· Optical resolution: 20 – 50 um

· Homogeneity (uniformity) of beam in focused plane: variation within +/- 5%

· Size (footprint): within 6 ft. x 12 ft. area

· Maximum height: 10 ft.

· Housing for beam path and substrate plane

· Safety interlocks Summary of System Excimer lasers operate at specific wavelengths (248 nm, 308 nm, etc.) uniquely defined by the gas species used as the excitation medium (KrF and XeCl, respectively). The lasing occurs in rapid pulses, typically tens of nanoseconds in duration (measured at FWHM intensity). As a result, the laser radiation is rapidly absorbed, and its energy completely imparted to a very thin layer of the target film without significantly damaging the underlying material. Because of the near-instantaneous heating of a small volume, the thermal energy generally diffuses quickly into the surroundings, allowing for the material to experience rapid cooling. In laser-annealing-induced phase transformations such as melting and solidification, this rapid cooling induces far-from-equilibrium kinetics-based effects such as solute trapping and non-stoichiometric composition freezing.