68-5050-16_Technical_Specifications.docx

Specifications for Chlorine-based Inductively Coupled Plasma Etch System

1. The Naval Research Laboratory (NRL) has a requirement for a chlorine-based inductively coupled plasma (ICP) etch system.

a. The primary requirement is for an ICP etch system for semiconductor processing, particularly etching III-N materials (GaN, AlN, InN, and related compounds). The ICP etch system must be a standard commercial product with demonstrated field use. Etch rates of GaN between 1 micron/min and 4 nm/min must be achievable.

b. The ICP etch system must be able to accommodate sample sizes from 10x10 mm to a single 4” wafer. Samples smaller than a 4” wafer must be able to be placed on a carrier wafer.

c. The system must include a fully automatic single wafer vacuum load lock with pneumatic transfer arm and have a vacuum gauge that read in the 1 to 1000 mTorr range. The load lock must be pumped by a customer supplied Edwards nXDS20i pump.

d. The etch chamber must be equipped with an ICP source with a power output >1000 W operating at a frequency of 13.56 MHz with automatching unit and separate RF generator to bias the substrate (>500W). The system must include a heated lower chamber, lid, and heated foreline to prevent condensation of etch products. The chamber must be equipped with two view ports, one suitable for end-point detection. The chamber must be equipped with a helium cooling system and wafer clamping mechanism, preferably electrostatic chuck that can handle non-conductive wafers. Filter endpoint system for inter-wafer cleans should be provided. Appropriate chamber seals should be made of perfluoroelastomer. Appropriate re-circulating chiller should be supplied for etch chamber for variable chuck between 0 °C to +50 °C. The system must have provisions for igniting low pressure (1 to 3 mTorr) plasmas.

e. The etch chamber pumping system must be suitable to handle required gases and process recipes. Approximate flow conditions are 100 sccm at a pressure of 5 mTorr. An automated, heated control and isolation valve must be included to achieve desired process pressure. The pumping system will require a combination of heated, maglev turbo pump (must be included) and backing pump. Systems must be in place to protect turbo pump in case of overheating or loss of power. The turbo pump must be backed by a customer supplied Edwards iXH100. The etch chamber must have vacuum gauges capable of reading in the 1 to 1000 mTorr and 10-8 to 10-4 Torr ranges. A by-pass around the turbo pump is required for rough pumping the etch chamber.

f. Six appropriate digital mass flow controllers (MFCs) in an extracted gas box must be installed for the following gases: Cl2, BCl3, Ar, N2, O2, SF6.

g. All processes must be controlled by a standalone computer with a graphical user interface (GUI) on a Windows operating system. The GUI should provide users with easy creation, editing, and storing of recipes. The GUI should provide real-time process data to include, at a minimum: gas flow for all MFCs, chamber pressure, load lock pressure, directly-coupled RF power level, ICP power level, reflected power levels, dc bias, temperature, and process times. The system must have password protected user access control. The system must be capable of automatic operation with manual override.

h. Appropriate safety features and interlocks must be included.

i. All components prior to assembly must be able to fit on a freight elevator with door dimensions of 6’ x 7’ (width x height) and car dimensions of 7.5’ x 8’ (depth x height). Additionally all components must fit through a laboratory door of 42” x 82” (width x height). Tool should be designed to limit laboratory footprint. Total system footprint (etch process module and load lock) should not exceed 5.5’ x 3’ (L x W).

j. System documentation should include facilities installation manual, user guide, safety manual, maintenance manual with illustrated parts locator, system diagram, and OEM documentation.

2. Delivery must occur 12 to 14 weeks after receipt of order.

3. Installation and Training: The contractor shall provide onsite installation of the equipment and demonstrate that the system meets the required specifications. The contractor shall also provide on-site training at the time of the installation and demonstration for two NRL personnel.

4. Warranty and Support: The contractor shall offer the Government at least the same warranty terms, including offers of extended warranties, offered to the general public in customary commercial practice.