N00174-15-Q-0444_SPECIFICATIONS.docx

SPECIFICATIONS SOLICITATION N00173-15-Q-0444

UHV Linear e-beam source with power supplies and controler

*Requirements*

~Four pocket System w/ 15cc crucibles & manual indexing.

~5 kW High Voltage Power Supplies w/ cables ~Controller with integral sweep contro1 ~Filament power supply . ~High Voltage and coil feedthroughs ~Pneumatic for pocket isolation ~On-site service to install e-beam system and issue user training on operation.

~Installation onto an existing slide rail system to allow rapid access for maintenance and exchange of material sources.

~Software operation of e-gun with existing system components in a closed loop process through integration of deposition controller software and main system software via a remote access file.

1 EA

UHV Magnetron Sputtering Source

*Requirements*

~6" CF flange, uses 2" diameter targets computer controlled pneumatic shutter ~Water-cooled ~Gas ring for gas injection to source head.

~Chimeny to minimize target cross-contamination and deposition in chamber ~Bakeable to 200C without disassembly ~Configured with modular magnet arrays allowing for balanced, unbalanced, and magnetic material deposition modes.

~Tiltable from outside the chamber while under vacuum with locking position indicator.

~Compatible with magnetic targets (including iron) up to 3mm thick

2 EA

Variable Frequency Pulsed DC Generator

*Requirements* ~5 kW ~Variable frequency of 5-350kHz ~Capable of continous DC operation ~Controllable through existing system software.

1 EA

Mass Spectrometer for Residual Gas Analysis.

*Requirements* ~Range: 1-200 amu ~Min detectable partial pressure =2x10-14 mbar ~Fast scan speed - 2 msec/amu ~Operate UHV to 1x10-4 mbar ~Detectors: Faraday cup and secondary electron multiplier ~Analyzer bakeable to 200 degrees C ~Control and analysis software for windows 7 (32-bit Pro)

1 EA