Attachment 1-NIST Statement of Work.pdf

Attachment 1-NIST Statement of Work Table-top Vacuum & Extreme Ultraviolet Source

17 APRIL 2023

I. Background

The requirement is for a laboratory-based, “turn-key” solution providing selectable vacuum-and extreme-ultraviolet (EUV, VUV) wavelengths. The project being pursued will allow the measurement of nanoscale semiconductor patterns by shining EUV and VUV light onto such samples and measuring with a camera system the reflected, diffracted, and scattered light to determine the dimensions of these patterned features. Such projects have been carried out at longer wavelengths at NIST, but this requirement is necessary to reduce the wavelength of light used to provide better information about nanoscale dimensions especially as semiconductor dimensions continue to decrease. As EUV and VUV light are absorbed by air, this source will output into a vacuum. The VUV+EUV Source will allow the isolation of certain wavelengths to improve our metrology and will also be augmented by equipment to characterize this VUV and EUV light.

Scope

A Table-top Vacuum- and Extreme-Ultraviolet Source: Quantity (1)

This table-top vacuum- and extreme-ultraviolet source is required to generate light at wavelengths in the extreme and vacuum ultraviolet (VUV and EUV), specifically 10 nm through 150 nm so that we can meet our mission of determining nanoscale dimensions of patterned wafers from reflected, scattered, and diffracted light, in support of the US Semiconductor Industry.

II. Minimum Requirements The system shall meet or exceed the minimum requirements identified below. All items must be new. Used or remanufactured equipment will not be considered for award.

Experimental, prototype, or custom items will not be considered. The use of “gray market” components not authorized for sale in the U.S. by the Contractor is not acceptable. All line items shall be shipped in the original manufacturer’s packaging and include all original documentation and software, when applicable.

NOTE: A photon’s wavelength L in nanometers (nm) corresponds to its energy E (in eV) using E[eV] = 1239.8/(L[nm]).

The Contractor shall provide the following (1) VUV+EUV Source that meet the following minimum specifications:

S1) Output characteristics:

S1.1) Wavelength/Energy Range:

i) The VUV+EUV source shall output spatially coherent radiation at wavelengths ranging from 10 nm up to 150 nm, or photon energies E=8.3 eV to 125 eV.

ii) This requirement can be satisfied using high-harmonic generation (HHG), wherein a lower energy laser source (e.g. 800 nm to 1100 nm, E=1.1 eV to 1.5 eV) is partially converted to higher energy photons, the odd frequency harmonics of the driving laser’s energy (e.g. for 800 nm, E =1.55 eV; 3E =

4.65 eV = 267 nm; 5E = 7.75 eV = 160 nm; 7E = 10.85 eV = 114.3 nm; 9E =

13.95 eV = 88.9 nm; 11E = 17.05 eV = 72.7 nm; 13E= 20.15eV = 61.5 nm;

15E = 23.25 eV = 53.3 nm; etc.)

iii) If utilizing the HHG method for the VUV+EUV Source, there shall be at least five harmonics between 150 nm and 50 nm (between E=8.3 eV and 24.8 eV) accessible at the output. Harmonics shall also be provided down to 10 nm wavelength.

iv) If not utilizing an HHG source, a broadband continuum of wavelengths between 10 nm to 150 nm is required.

S1.2) Photon flux :

i) The VUV+EUV source shall have the following minimum photon flux per wavelength and specified spectral bandwidth (full width at half maximum = FWHM). Metric applies to the output at the source, taking into consideration known and anticipated losses inherent in wavelength selection:

(1) Energy 92 eV, (13 nm wavelength), spectral bandwidth 10% FWHM:

photon flux >= 1E10 photons per second

(2) Energy 40 eV, (31 nm wavelength), spectral bandwidth 5 eV FWHM:

photon flux >= 1E10 photons per second.

S1.3) Output stability and monitoring:

i) The VUV+EUV source shall have a VUV/EUV photon flux stability below

5% RMS over an eight-hour period.

ii) The VUV+EUV Source shall have an insertable/retractable diode in the beam path (or equivalent) to monitor relative VUV+EUV intensities.

S1.4) Divergence and spot size :

i) The VUV+EUV source shall have a divergence no greater than 5 milliradians at EUV wavelengths (10 nm – 50 nm).

ii) The VUV+EUV Source output shall have a spot size no greater than 200 micrometers diameter at EUV wavelengths prior to the monochromator component (see S2.6) of the VUV+EUV Source.

S2) Components and interoperability:

S2.1) The VUV+EUV Source shall include the capability and equipment to divert part or all the source’s output to a NIST-supplied camera or spectrometer to characterize the VUV and EUV wavelengths generated.

S2.2) The VUV+EUV Source shall include the capability and equipment to linearly polarize the VUV and EUV light.

S2.3) As light at 10 nm to 150 nm is highly absorbed by air, the VUV+EUV Source shall be designed to output this light into a high-vacuum chamber (high vacuum defined here at P < 1E-6 Torr).

S2.4) The output of the VUV+EUV Source shall connect to NIST equipment using an ISO-KF flange, a standardized vacuum port typical of high vacuum equipment.

S2.5) The VUV+EUV Source shall include all the vacuum equipment needed for its own operation.

S2.6) The VUV+EUV source shall include a monochromator that will enable the selection of wavelengths at the target. The monochromator shall be a component of the VUV+EUV Source.

i) The monochromator component of the VUV+EUV Source shall have a minimum spectral bandwidth no greater than 1 % the wavelength (full width at half maximum (FWHM)) across the 10 nm to 150 nm wavelength range.

ii) The specification above may require one or multiple gratings, to be included.

S3) Pre-delivery:

S3.1) Upon award for the VUV+EUV source, the vendor shall provide the output beam height and the diameter of the ISO-KF port, to allow NIST to finalize development of NIST’s attaching hardware.

S3.2) One month after the award for the VUV+EUV source, the vendor shall provide A CAD drawing of the VUV+EUV Source to allow NIST to finalize planning for installation.

S3.3) Upon award for the VUV+EUV source, the vendor shall provide the electrical, vacuum, gases, cooling, etc. connections required and the horizontal clearance (height) such that NIST can prepare the intended laboratory the delivery and installation of the VUV+EUV source.

S3.4) Optical tables with tabletops with tapped holes are commonplace in optics laboratories. Upon award for the VUV+EUV source, the vendor shall provide the size(s), required footprint, positions, and number of optical tables required for the successful installation of the VUV+EUV Source.

S3.5) Upon award for the VUV+EUV source, the vendor shall provide information about the potential hazards of the VUV+EUV light source.

S4) Installation:

S4.1) The VUV+EUV System shall be delivered to and installed within Building 217, Room E116 of the NIST campus in Gaithersburg, Maryland. Shipment and installation of the system shall be provided by the vendor.

S4.2) The laboratory’s usable space is 25 feet by 12 feet (7.62 m by 3.66 m) with a service galley behind the laboratory. The VUV+EUV Source shall fit within an area no larger than 144 square feet (13.38 m^2), but support equipment (e.g., vacuum pumps) may be placed in the service galley.

S4.3) The vendor shall provide enough consumables (except gases) to demonstrate that the Source is in good working order after the installation. Gas volume and purity requirements will be clearly communicated to NIST prior to installation.

S5) Training:

S5.1) The VUV+EUV Source shall include training with the following minimum requirements:

i) At least two NIST staff will be instructed how to replicate the safe operation of the VUV+EUV source after installation.

ii) The training shall be performed by the vendor on-site, not virtually.

iii) The training shall include a minimum of 8 hours of instruction.

iv) The training shall be performed during NIST-Gaithersburg normal working hours (8 AM – 4 :30 PM Eastern Time).

S6) Additional Required Capabilities S6.1) The monochromator component of the VUV+EUV Source shall be movable into and out of the beam.

S6.2) The VUV+EUV Source shall include the capability and equipment to linearly polarize the VUV and EUV light using computer control to rotate the polarization linear axis between vertical and horizontal polarization.

S6.3) The VUV+EUV Source shall have the capability of diverting light to one of three NIST-provided end stations. S2.1 would be fulfilled in this requirement.

III. Delivery Delivery shall be FOB Destination (or equivalent terms, such as INCOTERMS Delivered Duties Paid) are required and shall occur not later than (NLT) 12 months ARO.

FOB Destination means: The contractor shall pack and mark the shipment in conformance with carrier requirements, deliver the shipment in good order and condition to the point of delivery specified in the purchase order, be responsible for any loss of and/or damage to the goods occurring before receipt and acceptance of the shipment by the consignee at the delivery point specified in the purchase order; and pay all charges to the specified point of delivery. The contractor shall deliver all Line Items to:

The National Institute of Standards and Technology 100 Bureau Drive, Building 217 Room E116 Gaithersburg, MD 20899-1640

IV. Inspection and Acceptance In addition to the inspection and acceptance terms articulated in 52.212-4, the Government reserves the right to perform such performance tests and evaluations as defined below to verify specified system performance. Such tests and evaluations, if performed, shall be conducted within the environment that the system is to be operated. The Contractor has the right to be present during the tests and evaluations, if performed, at the Contractor’s expense.

Performance of pre-delivery tasks (S3) will be verified after award. Performance test consists of successful operation of the VUV+EUV System upon training of the two NIST Staff (S4.4). NIST-supplied camera or spectrometer will be used to verify at least five wavelengths between 50 nm and 150 nm (S1.1.iii, S2.1, S6.3). NIST will verify the pressure at the KF flange (S2.3, S2.4). Installation shall be inspected visually (S4, S6.3).

Automated polarization rotation will be tested by monitoring reflectivity off a NIST-provided sample. (S6.2)

The Government will test, inspect, and accept the equipment onsite within 7 days business days of the receipt of the VUV+EUV Source system. A visual inspection of the VUV+EUV Source system will be performed by the NIST TPOC to identify surface defects or any form of indication that the VUV+EUV Source system was damaged during transport to NIST. The Government shall have sole discretion to require repair or replacement of damaged and/or nonconforming supplies at no cost to the Government. The Government at any time prior to acceptance shall reject the VUV+EUV Source system due to defects and/or nonconformance.

V. Warranty The contractor shall warrant the entire system for a period of a minimum of one year after receipt of the equipment and shall be in accordance with terms in FAR 52.212-4