SOW_Atomic_Force_Microscope.pdf

Atomic Force Microscope Procurement

Statement of Work

PCN:

Background

The GSFC Detector Development Laboratory (DDL) has a requirement to acquire a scanning probe microscope also referred to as an Atomic Force Microscope (AFM). The system is used to characterize the geometry and other physical properties of nanoscale structures built in the DDL. The system is suitable for characterizing thin-films on substrates up to 200 mm in diameter. It shall include all necessary software and hardware to enable microscope control and data analysis. The vendor shall provide equipment technical support.

Objectives

The objective of this project is to procure an Atomic Force Microscope (AFM).

Scope

The scope of this work includes production and delivery of an Atomic Force Microscope.

The AFM consists of a cantilever with a sharp tip which contacts a sample under test, a piezo element which manipulates the cantilever, a detector which records the motion of the cantilever, an XY stage which holds and manipulates the sample, a Z drive which controls the height of the sensor, a feedback control system for electronic signal conditioning, and a computer system for control of the microscope as well as storage and analysis of the raw and visual image data generated. The AFM will enable very high resolution measurement of nanometer and sub-nanometer scale thin films as well as surface textures of detectors and other devices under development and production in DDL. The Vender shall also provide an acoustic and vibration isolation enclosure to enable tool performance in typical cleanroom locations.

The AFM will serve as an upgrade of an existing obsolete system which is no longer supported by the manufacturer. The AFM will streamline current capabilities as well as enable new characterization capabilities for improved analysis of products manufactured in the DDL and tested in the Detector Characterization Laboratory. The equipment is essential for nearly all device fabrication projects under development and in production in

GSFC’s Detector System Branch. In particular, the equipment is immediately needed for technology development and production for Cosmic Microwave Background Polarization technology, Microwave Kinetic Inductance Detectors, Far-Infrared bolometers, X-Ray

Calorimeters, Large Format Magnetic Calorimeters, and Microfluidic Components, EUV and Far-IR/Sub-mm optical components and MicroElectroMechanical Microshutters all of which are important to Goddard’s lines of business.

Schedule of Tasks:

a) Construction of the AFM at the vendor facility.

b) Crating and Shipping of the unit to GSFC where the vendor’s personnel shall install it.

c) Installing, demonstrating, and training, of approximately three GSFC personnel, on the AFM at GSFC.

Tasks or Requirements

The Supplier shall provide a new Atomic Force Microscope (also referred to as a scanning probe microscope). The Supplier shall insure that the AFM is equipped with the following equipment and meet the following requirements prior to Acceptance of

System:

1. Atomic Force Microscope General Requirements

1.1. A brand new unit is required; no used equipment or accessories are acceptable.

The unit must be a production model with at least 5 similar units working in the field.

1.2. The AFM shall meet current industry standard (semi S2) requirements for safety.

2. Sample Chuck

2.1. A minimum 210 mm diameter sample chuck shall hold up to 200 mm diameter samples or wafers up to 15 mm thick. It shall also hold smaller wafer or sample sizes via vacuum or magnet. An integrated vacuum pump shall be included with the system.

2.2. The sample chuck shall be motorized with computer controlled and provide XY travel range on one axis of at least 200 mm with 3 um positional bidirectional repeatability.

2.3. The stage shall be controlled with closed loop feedback system for low noise and low drift control. The stage shall meet or exceed the following requirements:

0.2 nm noise in XY, 0.04 nm noise in Z. < 0.05 nm noise floor in XY, < 0.25 nm

XY drift / min, positioning repeatability < 5 um.

3. Scanner and controller

3.1. The scanner shall provide high resolution imaging of the sample surface via all standard scanning probe operating modes including contact mode, force mode, phase imaging tapping mode and maximum force mode.

3.2. Maximum force mode shall enable direct control of imaging forces with setpoints less than 50 pN with images acquired at scan rates of 1000’s of force curves per second enabling extraction of adhesion force, modulus (1 MPa – 50 GPa), deformation, while simultaneously imaging sample topography at high resolution and conventional imaging rates.

3.3. The scanner shall have a minimum XY range of 90 um and minimum Z range of

10 um.

3.4. The scanner shall be capable of < 300 nm closed loop scan ranges.

3.5. Scanner closed loop XY noise shall be < 0.15 um RMS and Z noise < 35 pm

RMS in imaging bandwidth of 625 Hz

3.6. The scanner shall be controlled by a multichannel controller with 500 kHz feedback loop enabling highest resolution 5k x 5k pixels.

3.7. The controller shall provide feedback on the maximum force sensed in tapping mode with low force control down to at least 50 pN enabling increased AFM tip life and high resolution imaging.

3.8. The controller shall provide automated cantilever parameter optimization such that the user is not required to manually tune the resonance of the cantilever prior to measurement when using modes based on tapping.

3.9. The controller and scanner shall be easily upgradable to alloy for additional scanning modes such as nanolithography, force modulation, magnetic force microscopy, and nanoindentation.

4. Software analysis and control

4.1. The system shall include a software packaging supporting real-time image processing and analysis features such as 3D rendering, Fourier analysis, data filtering, force curve analysis

4.2. The system shall enable automated measurements of multiple sites on a sample and shall include:

4.3. a method for aligning the sample to the AFM probe, and automatically navigating the sample.

4.4. The software shall perform single or multiple measurement types on a wafer at each location, display data processing results for each capture as well as a complete session summary report of all results from a measurement.

4.5. A Recipe editor for specification of a scan and analysis points to be provided at user specified locations on a sample with location accuracy < 3 um. The automation software shall include atomic force pattern recognition and auto focus functions such that tens of nanometer positioning is achievable on patterned samples.

4.6. The AFM shall include automatic optical image pattern recognition to ensure the sample is measured in the correct location to < 0.1 um error.

5. Scanning probes and holders

5.1. The systems shall include a minimum of two taping and scanning probe holders

5.2. A minimum of 20 SiNx and 40 Tapping mode probes

5.3. A minimum of 20 fluid compatible scanning probes.

6. Computer and AFM interface

6.1. The AFM shall include a computer interface (Intel iCore processor) for control of the system and logging and displaying of data and sample positioning. The computer shall run Windows 7 or newer operating system.

6.2. A 30” diagonal LCD flatscreen monitor shall be provided data display.

7. Facilities

7.1. The AFM and all required components will operate from standard 120V/60Hz

7.2. Exterior surface parts shall be compatible with operation in a Class 1000 cleanroom environment.

7.3. The vendor shall include an integrated vibration/acoustic isolation chamber with the tool enabling it to provide full performance in typical Class 100 cleanroom environments. The chamber shall be less than or equal to 36”wide x 33”deep x

63.5” high.

7.4. The relative location of the microscope with respect to the computer and control electronics (left or right) shall be at the discretion of the user and not preconfigured by the Vendor.

8. Installation and Training

8.1. The vendor shall include delivery of the instrument to Goddard Space Flight

Center.

8.2. The vendor shall install the AFM at GSFC. Installation shall include a performance demonstration by a factory trained technician showing that the tool is within compliance of the specifications.

8.3. At the completion of installation and demonstration, the vendor shall provide on-location operational training to at least two engineers at GSFC for a minimum of

5 days.

9. Documentation and Warranty

9.1. A full set of all written documentation shall be provided by the vendor with purchase of the system. This will include user manuals or equivalent as well as copies of any software, and any manuals for the software included with the system. This documentation shall be received by GSFC with the system hardware.

9.2. The vendor shall offer the GSFC at least the same warranty terms, including offers of extended warranties, offered to the general public in customary commercial practice. Warranty terms must be included in the system price. The period of warranty will begin upon acceptance of the system.

The technical merit of the Vendors’ proposal will be evaluated in terms of the limit to which the vendor exceeds the technical specifications listed in this statement of work.

Deliverables or Delivery Schedule

Deliver complete specified (as described above) system. Set up and install all components at GSFC Detector Development Laboratory.

1. Deliver tool within 12 weeks of receipt of order.

2. Demonstrate system with specified performance/acceptance criteria (described above). Acceptance of system will be conditional upon successful demonstration of functions.

3. Provide user training for equipment operation.

4. Equipment warranty on parts and labor for at least one year.

5. Deliver Operational manuals

6. Spare parts including extra cantilever holders, probes.

Government-Furnished Equipment and Government-Furnished Information

No Government-furnished equipment (GPE) and Government-furnished information

(GFI) will be required

Security

The Supplier Representative who will be installing the atomic force microscope and

Training NASA personnel must be a US Citizen.

Place of Performance

The Construction of the atomic force microscope shall be performed at the Vendor’s facilities.

The Installation and Training shall be performed at NASA/GSFC, Greenbelt Maryland.