This SBIR Phase I award from the National Science Foundation's (NSF) Technology, Innovation, and Partnerships (TIP) program, with a total funding amount of $274,985, is focused on developing an artificial intelligence (AI) system to accelerate semiconductor production using physics-embedded lithographic foundation models. The project aims to alleviate design and manufacturing complexities associated with the shift to extreme ultraviolet (EUV) lithography in semiconductor manufacturing, which has led to higher costs and stifled innovation. The proposed work will create a Lithography Foundation Model (LFM) that integrates physical modeling to enable rigorous accuracy across various process conditions, coupled with hardware-software optimization for real-time, high-precision simulations. This innovation is expected to significantly boost efficiency, reduce costs, and accelerate time-to-market for new chip designs, addressing current limitations in next-generation semiconductor process nodes. The project is being conducted by Exigent Solutions, Inc., a for-profit, Asian-Pacific American-owned small business, with an award period from February 2024 to January 2025. No sub-awards are planned for this project.
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